SCHEMBL1108024

SCHEMBL1108024

C=C(C)C(=O)OC(C)(CC)CC

nearest known ligand 0.43

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.43
ALDH1A1 P00352 2/20 0.42
THRB P10828 1/20 0.41
GAA P10253 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL7724540 0.98 TSHR (0.42) TSHRALDH1A1THRBGAACYP1A2
SCHEMBL12265669 0.91 TSHR (0.41) TSHRALDH1A1THRBGAACYP1A2
SCHEMBL14477462 0.90 TSHR (0.39) TSHRALDH1A1THRB
SCHEMBL14509496 0.88 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL18231537 0.88 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL23494134 0.88 TSHR (0.39) TSHRALDH1A1THRBGAA
SCHEMBL15219177 0.86 TSHR (0.37) TSHRALDH1A1THRBGAA
SCHEMBL23494191 0.86 TSHR (0.46) TSHRALDH1A1THRB
SCHEMBL12941443 0.86 TSHR (0.37) TSHRALDH1A1THRBGAA
SCHEMBL18768252 0.86 TSHR (0.37) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025024325-A2 ALL-ACRYLIC TRIBLOCK AND TETRABLOCK COPOLYMERS HAVING A LACTAM MOIETY AND APPLICATIONS THEREOF ISP INVESTMENTS LLC (US) 2025-01-30 WO claimed
CN-102444021-A Intelligent waterproof and moisture permeable fabric XIANGRUI QUANZHOU NANO TECHNOLOGY CO LTD 2012-05-09 CN claimed
WO-2025024325-A2 ALL-ACRYLIC TRIBLOCK AND TETRABLOCK COPOLYMERS HAVING A LACTAM MOIETY AND APPLICATIONS THEREOF ISP INVESTMENTS LLC (US) 2025-01-30 WO disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241441-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240027905-A1 PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240027904-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240019779-A1 COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-18 US disclosed
CN-112980543-B High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity 英菲诺姆国际有限公司 2023-12-19 CN disclosed
CN-112980549-B High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity 英菲诺姆国际有限公司 2023-12-15 CN disclosed
US-11809077-B2 Photoresist compositions and pattern formation methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-11-07 US disclosed
US-20080038561-A1 Coating Composition, Optical Film, Antireflective, Film, Polarizing Plate, And Display Device Using The Same FUJIFILM CORPORATION (JP) 2008-02-14 US disclosed
US-20080038561-A1 Coating Composition, Optical Film, Antireflective, Film, Polarizing Plate, And Display Device Using The Same FUJIFILM CORPORATION (JP) 2008-02-14 US disclosed
CN-101084044-A Cosmetic preparations containing copolymers of ethyl methacrylate and at least one monoethylenically unsaturated carboxylic acid BASF AG (DE) 2007-12-05 CN disclosed
CN-1708728-A Radiation-sensitive resin composition JSR CORP (JP) 2005-12-14 CN disclosed
US-6379861-B1 POLY(METH)ACRYLATE ESTER WITH TERTIARY OR QUATERNARY CARBON AND PHOTOACTIVE COMPOUND; HIGH RESOLUTION RELIEF IMAGES; CHEMICALLY-AMPLIFIED POSITIVES SHIPLEY COMPANY, L.L.C. 2002-04-30 US disclosed
US-6136501-A PHOTORESIST COMPOSITION COMPRISING PHOTOACTIVE COMPONENT AND POLYMER THAT COMPRISES ESTER GROUPS SHIPLEY COMPANY, L.L.C. (US) 2000-10-24 US disclosed
CN-1097428-A Water dispersion preparation method with methacrylic anhydride precrosslink ATOCHEM ELF SA (FR) 1995-01-18 CN disclosed
US-4258204-A REACTING ALPHA, BETA-UNSATURATED ORGANIC ACID HALIDE WITH ALCOHOL IN PRESENCE OF MOLECULAR SIEVE UNIVERSITY PATENTS, INC. (US) 1981-03-24 US disclosed
US-4048130-A COPOLYMERIZATION, UNSATURATED ACIDS LONZA LTD. (CH) 1977-09-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240019779-A1 COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME CRY1, CCNT1, CCNA1 TSHR 3135/4885ALDH1A1 382/4885THRB 3729/4885
US-20240027904-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS C1S, C1R, CRY2 TSHR 839/4885ALDH1A1 3079/4885THRB 2348/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.