SCHEMBL11085613

SCHEMBL11085613

CCCCC(CC)CNCCC(=O)OC

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.56
CYP3A4 P08684 3/20 0.56
ALDH1A1 P00352 3/20 0.56
ATM Q13315 1/20 0.49
TDP1 Q9NUW8 1/20 0.49
CA12 O43570 2/20 0.45
CA14 Q9ULX7 2/20 0.45
CA2 P00918 4/20 0.45
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
KDM4E B2RXH2 1/20 0.42
CA1 P00915 1/20 0.42
HTT P42858 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
GLA P06280 1/20 0.42
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP14 P50281 1/20 0.40
LMNA P02545 1/20 0.39
POLB P06746 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27000290 0.94 CYP3A4 (0.49) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL5433467 0.86 TSHR (0.53) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL17779432 0.85 CYP3A4 (0.51) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL9719720 0.83 TSHR (0.60) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL29268656 0.83 CYP3A4 (0.69) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL27833079 0.81 CA2 (0.61) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL25214299 0.81 CA2 (0.65) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL8601998 0.79 TSHR (0.47) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL11417438 0.79 TSHR (0.58) TSHRCYP3A4ALDH1A1ATMTDP1
SCHEMBL4909383 0.78 TSHR (0.82) TSHRCYP3A4ALDH1A1ATMTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023100459-A1 SURFACTANT COMPOSITION FOR COSMETIC AND COSMETIC 三洋化成工業株式会社 2023-06-08 WO disclosed
US-4473491-A Alkanolamine salts of cyclic amide acids and their use as metal corrosion inhibitors in aqueous systems BASF AKTIENGESELLSCHAFT (DE) 1984-09-25 US disclosed