SCHEMBL1109632

SCHEMBL1109632

CC(C)(S)C(=O)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 7/20 0.54
SRC P12931 1/20 0.48
CA2 P00918 2/20 0.48
CA4 P22748 2/20 0.48
CA12 O43570 1/20 0.48
CA1 P00915 1/20 0.48
CA3 P07451 1/20 0.48
CA6 P23280 1/20 0.48
CA5A P35218 1/20 0.48
CA7 P43166 1/20 0.48
CA9 Q16790 1/20 0.48
CA13 Q8N1Q1 1/20 0.48
CA14 Q9ULX7 1/20 0.48
CA5B Q9Y2D0 1/20 0.48
TSHR P16473 4/20 0.46
CES2 O00748 4/20 0.46
ALDH1A1 P00352 2/20 0.46
DAO P14920 1/20 0.46
NAPRT Q6XQN6 1/20 0.46
TDP1 Q9NUW8 4/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL8757338 0.98 CES1 (0.52) CES1SRCCA2CA4CA12
Hydrochloric Acid SCHEMBL7100753 0.98 CES1 (0.52) CES1SRCCA2CA4CA12
SCHEMBL17238642 0.86 CES1 (0.54) CES1SRCCA2CA4CA12
SCHEMBL11356416 0.84 CES1 (0.52) CES1SRCCA2CA4CA12
SCHEMBL14225758 0.82 ALDH1A1 (0.50) CES1ALDH1A1TDP1MAPTL3MBTL1
SCHEMBL11107983 0.82 CES1 (0.50) CES1SRCCA2CA4CA12
SCHEMBL11444430 0.82 CES1 (0.50) CES1SRCCA2CA4CA12
Hydrochloric Acid SCHEMBL11106435 0.80 CES1 (0.48) CES1SRCCA2CA4CA12
SCHEMBL21109870 0.80 CES1 (0.58) CES1SRCCA2CA4CA12
SCHEMBL226691 0.80 CES1 (0.58) CES1SRCCA2CA4CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 263 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026100367-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD 東京応化工業株式会社 2026-05-15 WO disclosed
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD CANON KK (JP) 2026-04-30 US disclosed
EP-4722810-A1 RESIST MATERIAL, PATTERN FORMING METHOD, AND PATTERNED STRUCTURE Tokyo Ohka Kogyo Co., Ltd. (JP) 2026-04-08 EP disclosed
EP-4722814-A1 PATTERN FORMING METHOD AND PROCESSING LIQUID FOR METAL COMPOUND-CONTAINING FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2026-04-08 EP disclosed
EP-4722811-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2026-04-08 EP disclosed
EP-3741811-B1 COMPOUND, INK, RESIST COMPOSITION FOR COLOR FILTER, THERMAL TRANSFER RECORDING SHEET, AND TONER CANON KK (JP) 2026-03-11 EP disclosed
EP-4696511-A1 INK-JET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-18 EP disclosed
US-20260042294-A1 INK-JET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
EP-0948502-A1 CYANOPHOSPHORUS COMPOUNDS AND THEIR PREPARATION MONSANTO COMPANY (US) 1999-10-13 EP disclosed
EP-0948506-A1 CYANOPHOSPHONATE DERIVATIVES MONSANTO COMPANY (US) 1999-10-13 EP disclosed
US-5945082-A HERBICIDES, INSECTICIDES, FLAME RETARDANTS, PLASTICIZERS; CYANATION, SALT FORMATION, PHOSPHONATION, PHOSPHATING MONSANTO COMPANY (US) 1999-08-31 US disclosed
US-5935542-A Cyanphosphonate derivatives and method for their preparation MONSANTO COMPANY (US) 1999-08-10 US disclosed
EP-0922708-A2 Production method of borate compounds SHOWA DENKO KABUSHIKI KAISHA (JP) 1999-06-16 EP disclosed
WO-1998029419-A1 CYANOPHOSPHORUS COMPOUNDS AND THEIR PREPARATION MONSANTO COMPANY (US) 1998-07-09 WO disclosed
WO-1998029422-A1 CYANOPHOSPHONATE DERIVATIVES MONSANTO COMPANY (US) 1998-07-09 WO disclosed
EP-0555058-B1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MFG CO (JP) 1997-05-07 EP disclosed
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed
EP-0555058-A1 (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition TOYO INK MANUFACTURING CO., LTD. (JP) 1993-08-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT3, OR10J3, RFT1 CES1 1566/4885SRC 1997/4885CA2 1279/4885
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD ASIC1, PTGER1, PELP1 CES1 1835/4885SRC 2735/4885CA2 1901/4885
US-20260042294-A1 INK-JET RECORDING HEAD SEM1, ASIC1, C9 CES1 3431/4885SRC 1695/4885CA2 922/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.