Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 8/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 2/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31233774 | 1.00 | MEN1 (0.42) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL9304464 | 0.91 | MEN1 (0.41) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL12595121 | 0.90 | MEN1 (0.42) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL30139585 | 0.89 | HTT (0.44) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL335568 | 0.89 | HTT (0.44) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL28177879 | 0.87 | CA1 (0.40) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL13475516 | 0.84 | MAOB (0.43) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL12595120 | 0.83 | MEN1 (0.39) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL13367173 | 0.83 | CA12 (0.38) | MEN1KMT2ACA12CA1CA2 | |
| SCHEMBL4905251 | 0.82 | MAOB (0.40) | MEN1KMT2ACA12CA9LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0568993-B1 | Chemical amplification resist composition | KYOWA HAKKO KOGYO KK (JP) | 1998-08-12 | — | — | EP | claimed |
| US-5527659-A | PHOTOSENSITIVITY | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1996-06-18 | — | — | US | claimed |
| US-4963463-A | Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-10-16 | — | — | US | claimed |
| EP-0330406-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-08-30 | — | — | EP | claimed |
| JP-5247386-A | — | — | None | — | — | JP | disclosed |
| JP-4110348-A | — | — | None | — | — | JP | disclosed |
| JP-4069662-A | — | — | None | — | — | JP | disclosed |
| US-20250213434-A1 | DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY | KURARAY NORITAKE DENTAL INC. (JP) | 2025-07-03 | — | — | US | disclosed |
| EP-4505992-A1 | DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY | Kuraray Noritake Dental Inc. (JP) | 2025-02-12 | — | — | EP | disclosed |
| WO-2024075641-A1 | POLYMER MATERIAL FOR USE IN DENTISTRY | サンメディカル株式会社 | 2024-04-11 | — | — | WO | disclosed |
| WO-2023243636-A1 | MEMBER PROCESSING METHOD | 日東電工株式会社 | 2023-12-21 | — | — | WO | disclosed |
| WO-2023243634-A1 | TRANSFER SHEET | 日東電工株式会社 | 2023-12-21 | — | — | WO | disclosed |
| JP-H05247386-A | POSITIVE-TYPE PHOTOSENSITIVE ANIONIC ELECTRODEPOSITION COATING RESIN COMPOSITION, COATING THEREFROM, BATH THEREFOR, COATING METHOD AND PRODUCTION OF PRINTED CIRCUIT BOARD | HITACHI CHEM CO LTD | 1993-09-24 | — | — | JP | disclosed |
| EP-0542485-A1 | Radiation curable compositions | Dow Corning Limited (GB) | 1993-05-19 | — | — | EP | disclosed |
| JP-H04110348-A | PHOTOSENSITIVE POLYIMIDE COMPOSITION AND ITS DEVELOPMENT | UBE IND LTD | 1992-04-10 | — | — | JP | disclosed |
| JP-H0469662-A | RESIST PROCESSING METHOD | JAPAN SYNTHETIC RUBBER CO LTD | 1992-03-04 | — | — | JP | disclosed |
| US-4963463-A | Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-10-16 | — | — | US | disclosed |
| EP-0377175-A2 | Pattern forming composition and process for forming pattern using the same | HITACHI, LTD. (JP) | 1990-07-11 | — | — | EP | disclosed |
| EP-0330406-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-08-30 | — | — | EP | disclosed |
| JP-H00469662-A | — | — | 0001-01-01 | — | — | JP | disclosed |