Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | HTR1A | P08908 | 1/20 | 0.40 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.40 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.40 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 2/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30139585 | 1.00 | HTT (0.44) | HTTKMT2AMEN1CA12CA1 | |
| SCHEMBL948241 | 0.90 | PRMT5 (0.45) | KMT2AMEN1CA12HTR1AADRA1D | |
| SCHEMBL31233774 | 0.89 | MEN1 (0.42) | KMT2AMEN1CA12CA1CA2 | |
| SCHEMBL1109650 | 0.89 | MEN1 (0.42) | KMT2AMEN1CA12CA1CA2 | |
| SCHEMBL9304464 | 0.87 | MEN1 (0.41) | KMT2AMEN1CA12CA1CA2 | |
| SCHEMBL948622 | 0.86 | ALDH1A1 (0.36) | HTTKMT2AMEN1HTR1AALDH1A1 | |
| SCHEMBL12595121 | 0.86 | MEN1 (0.42) | KMT2AMEN1CA12CA1CA2 | |
| SCHEMBL13475516 | 0.86 | MAOB (0.43) | KMT2AMEN1CA12CA1CA2 | |
| SCHEMBL8075081 | 0.83 | S100A4 (0.45) | HTTKMT2AMEN1CA12CA1 | |
| SCHEMBL10404455 | 0.81 | HTR1A (0.40) | HTTKMT2AMEN1CA12CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3084522-B1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING THE SAME | MERCK PATENT GMBH (DE) | 2020-09-09 | — | — | EP | claimed |
| EP-3049449-B1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2019-01-09 | — | — | EP | claimed |
| EP-3084522-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2016-10-26 | — | — | EP | claimed |
| EP-3049449-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2016-08-03 | — | — | EP | claimed |
| US-9181449-B2 | Underlayer composition for promoting self assembly and method of making and using | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-11-10 | — | — | US | claimed |
| US-9093263-B2 | Underlayer composition for promoting self assembly and method of making and using | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2015-07-28 | — | — | US | claimed |
| US-20150166821-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MATERIALS (LUXEMBOURG) | 2015-06-18 | — | — | US | claimed |
| WO-2015044215-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-04-02 | — | — | WO | claimed |
| US-20150093912-A1 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2015-04-02 | — | — | US | claimed |
| US-7923167-B2 | Polymer electrolyte membrane, method of manufacturing the same and fuel cell using the polymer electrolyte membrane | SAMSUNG SDI CO., LTD. (KR) | 2011-04-12 | — | — | US | claimed |
| US-6887653-B2 | Method for structuring a photoresist layer | INFINEON TECHNOLOGIES AG (DE) | 2005-05-03 | — | — | US | claimed |
| US-6841332-B2 | Photoresist compound and method for structuring a photoresist layer | INFINEON TECHNOLOGY AG (DE) | 2005-01-11 | — | — | US | claimed |
| US-6746827-B2 | INCLUDING A FILM-FORMING POLYMER CONTAINING MOLECULE GROUPS CONVERTABLE INTO ALKALI-SOLUBLE GROUPS BY ACID-CATALYZED REACTION, A PHOTOACID GENERATOR AND A THERMOBASE GENERATOR; SEMICONDUCTORS; CROSSLINKING INHIBITION; ACCURACY; SMOOTHNESS | INFINEON TECHNOLOGIES AG (DE) | 2004-06-08 | — | — | US | claimed |
| US-6740475-B2 | INCLUDING A FILM-FORMING POLYMER CONTAINING MOLECULE GROUPS CONVERTABLE INTO ALKALI-SOLUBLE GROUPS BY ACID-CATALYZED REACTION, A PHOTOACID GENERATOR AND A THERMOBASE GENERATOR; SEMICONDUCTORS; CROSSLINKING INHIBITION; ACCURACY; SMOOTHNESS | INFINEON TECHNOLOGIES AG (DE) | 2004-05-25 | — | — | US | claimed |
| US-20030022111-A1 | Photoresist compound and method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2003-01-30 | — | — | US | claimed |
| US-20020160317-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| US-20020160318-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| US-20020160315-A1 | Process for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| US-4963463-A | Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-10-16 | — | — | US | claimed |
| EP-0330406-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-08-30 | — | — | EP | claimed |