Phosphoric Acid

Phosphoric Acid

SCHEMBL11131007

CCCCCCCCCCCCCCCCCC.O=P(O)(O)O

nearest known ligand 0.68

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 6/20 0.68
LPAR2 Q9HBW0 3/20 0.68
FDPS P14324 11/20 0.59
GGPS1 O95749 6/20 0.59
LPAR1 Q92633 2/20 0.59
TSHR P16473 1/20 0.57
THRB P10828 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Octane SCHEMBL4445679 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Decane SCHEMBL5015979 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Hexadecane SCHEMBL3437134 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Dodecane SCHEMBL1262800 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Phosphoric Acid SCHEMBL11052344 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Decane SCHEMBL16986478 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Octane SCHEMBL9461155 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Dodecane SCHEMBL11581918 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Octane SCHEMBL21854612 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1
Octane SCHEMBL3458550 1.00 LPAR3 (0.68) LPAR3LPAR2FDPSGGPS1LPAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103061118-B Oiling agent for polyester filament yarn SHANGHAI QIUCHENG NEW MAT TECH 2014-08-06 CN claimed
CN-103061118-A Oiling agent for polyester filament yarn SHANGHAI QIUCHENG NEW MAT TECH 2013-04-24 CN claimed
CN-108258092-B Quantum rod, quantum rod film having quantum rod, and quantum rod display device 乐金显示有限公司 2020-05-15 CN disclosed
CN-108258092-A Quantum rod, quantum rod film having quantum rod, and quantum rod display device 乐金显示有限公司 2018-07-06 CN disclosed
CN-106087406-B Polyester filament oil agent 上海多纶化工有限公司 2018-06-22 CN disclosed
CN-106087406-A Novel polyester filament oil preparation 上海多纶化工有限公司 2016-11-09 CN disclosed
CN-103061118-B Oiling agent for polyester filament yarn SHANGHAI QIUCHENG NEW MAT TECH 2014-08-06 CN disclosed
CN-102449797-B Electronic component and method for manufacturing electronic component OSRAM OPTO SEMICONDUCTORS GMBH 2014-08-06 CN disclosed
CN-103061118-A Oiling agent for polyester filament yarn SHANGHAI QIUCHENG NEW MAT TECH 2013-04-24 CN disclosed
CN-102449797-A Electronic component and method for manufacturing electronic component OSRAM OPTO SEMICONDUCTORS GMBH 2012-05-09 CN disclosed
CN-100335271-C Printing material contact part with ink expelling coating and its coating method HEIDELBERGER DRUCKMASCH AG (DE) 2007-09-05 CN disclosed
CN-1491795-A Printing material contact part with ink expelling coating and its coating method ���±�ӡˢ��е�ɷݹ�˾ 2004-04-28 CN disclosed
CN-1056147-C Process for the preparation of phosphoric monoester KAO CORP (JP) 2000-09-06 CN disclosed
CN-1158132-A Process for producing phosphoric monoester KAO CORP (JP) 1997-08-27 CN disclosed
US-4423270-A HYDROPHOBIC, PHOSPHONIC ACID PEARSON DONALD E 1983-12-27 US disclosed