Phosphoric Acid

Phosphoric Acid

SCHEMBL11136191

O=P(O)(O)O.[Cu].[NaH]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphoric Acid SCHEMBL7077597 1.00 CA2 (0.46)
Phosphoric Acid SCHEMBL525245 0.94
Phosphoric Acid SCHEMBL29250552 0.94
Phosphoric Acid SCHEMBL3953253 0.94 CA2 (0.50)
Phosphoric Acid SCHEMBL155938 0.94 CA2 (0.50)
Phosphoric Acid SCHEMBL317957 0.94 CA2 (0.50)
Phosphoric Acid SCHEMBL1539029 0.94 CA2 (0.50)
Phosphoric Acid SCHEMBL21331082 0.94 CA2 (0.50)
Phosphoric Acid SCHEMBL4940740 0.94 CA2 (0.50)
Phosphoric Acid SCHEMBL98067 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110034295-B Preparation method of dopamine-coated copper phosphate sodium ion battery positive electrode material 陕西科技大学 2020-07-31 CN claimed
CN-112304881-B Analysis device, program, and analysis method 东亚DKK株式会社 2024-08-13 CN disclosed
CN-115501339-B Copper-based nano enzyme active material for repairing various wound surfaces difficult to heal, application of copper-based nano enzyme active material and wound repair gel 温州爱恩思生物科技有限公司 2024-07-09 CN disclosed
EP-4365145-A2 ANTIMICROBIAL GLASS COMPOSITIONS, GLASSES AND POLYMERIC ARTICLES INCORPORATING THE SAME Corning Incorporated (US) 2024-05-08 EP disclosed
EP-3107874-B1 ANTIMICROBIAL GLASS COMPOSITIONS, GLASSES AND POLYMERIC ARTICLES INCORPORATING THE SAME CORNING INC (US) 2024-04-10 EP disclosed
CN-112304881-A Analysis device, program, and analysis method 东亚DKK株式会社 2021-02-02 CN disclosed
CN-110034295-B Preparation method of dopamine-coated copper phosphate sodium ion battery positive electrode material 陕西科技大学 2020-07-31 CN disclosed
CN-110034295-B Preparation method of dopamine-coated copper phosphate sodium ion battery positive electrode material 陕西科技大学 2020-07-31 CN disclosed
CN-110034295-B Preparation method of dopamine-coated copper phosphate sodium ion battery positive electrode material 陕西科技大学 2020-07-31 CN disclosed
US-4418056-A Process for making cupric hydroxide CUPROQUIM S.A. (MX) 1983-11-29 US disclosed
US-4028424-A FROM AN ALPHA-OLEFIN AND AN ALDEHYDE JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1977-06-07 US disclosed
US-3941627-A Method of producing tarnish resistant copper and copper alloys and products thereof OLIN CORPORATION (US) 1976-03-02 US disclosed
US-3940303-A Method of producing tarnish resistant copper and copper alloys and products thereof OLIN CORPORATION (US) 1976-02-24 US disclosed