SCHEMBL11201848

SCHEMBL11201848

O=C(OCCN1CCOCC1)c1ccc(O)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ ATM Q13315 1/20 1.00
▸ KMT2A Q03164 2/20 0.74
▸ MEN1 O00255 1/20 0.74
▸ SMN1; SMN2 Q16637 2/20 0.65
▸ ALDH1A1 P00352 5/20 0.64
▸ KDM4E B2RXH2 2/20 0.64
▸ HPGD P15428 1/20 0.64
▸ GAA P10253 2/20 0.62
▸ PKM P14618 1/20 0.62
▸ CYP2D6 P10635 1/20 0.62
▸ L3MBTL1 Q9Y468 1/20 0.61
▸ LMNA P02545 2/20 0.58
▸ ESR1 P03372 1/20 0.51
▸ CHRM1 P11229 1/20 0.51
▸ TSHR P16473 1/20 0.51
▸ SLC6A2 P23975 1/20 0.51
▸ KDR P35968 1/20 0.51
▸ TDP1 Q9NUW8 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11081554 0.99 ATM (0.97) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL8489898 0.87 ATM (0.77) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL2821475 0.87 ATM (0.77) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL8489893 0.87 ATM (0.77) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL5925536 0.87 ATM (0.77) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL24177773 0.87 ATM (0.77) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL501720 0.87 ATM (0.76) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL10174568 0.86 ATM (0.75) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL14369836 0.86 ATM (0.75) ATMKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL5350446 0.85 ATM (0.74) ATMKMT2AMEN1SMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
US-20220004101-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-06 — — US disclosed
EP-0071433-A1 Medicine for the treatment of diabetes KOWA COMPANY, LTD. (JP) 1983-02-09 — — EP disclosed
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