SCHEMBL5350446

SCHEMBL5350446

O=C(OCCN1CCOCCOCCOCCOCCOCC1)c1ccccc1

nearest known ligand 0.94

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.74
GAA P10253 2/20 0.70
L3MBTL1 Q9Y468 1/20 0.68
ALDH1A1 P00352 8/20 0.63
KMT2A Q03164 5/20 0.61
LMNA P02545 1/20 0.61
SMN1; SMN2 Q16637 2/20 0.61
KDM4E B2RXH2 2/20 0.60
HPGD P15428 1/20 0.60
MAPT P10636 2/20 0.60
PKM P14618 2/20 0.56
MEN1 O00255 2/20 0.56
CYP1A2 P05177 1/20 0.56
CYP3A4 P08684 1/20 0.56
CYP2D6 P10635 1/20 0.56
CYP2C9 P11712 1/20 0.56
CYP2C19 P33261 1/20 0.56
PRCP P42785 1/20 0.56
TMEM97 Q5BJF2 1/20 0.56
SIGMAR1 Q99720 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14369843 1.00 ATM (0.74) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL501720 0.98 ATM (0.76) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL501945 0.90 ATM (0.73) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL27467014 0.89 KDM4E (0.63) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL14369836 0.86 ATM (0.75) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL11201848 0.85 ATM (1.00) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL501862 0.84 KMT2A (0.72) ATMALDH1A1KMT2ASMN1; SMN2HPGD
SCHEMBL24177773 0.84 ATM (0.77) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL8489898 0.84 ATM (0.77) ATMGAAL3MBTL1ALDH1A1KMT2A
SCHEMBL8608239 0.84 ALDH1A1 (0.61) ATMGAAL3MBTL1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7276324-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-02 US disclosed
US-7276324-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-02 US disclosed
US-7276324-B2 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-02 US disclosed
US-20050106500-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2005-05-19 US disclosed