SCHEMBL11202607

SCHEMBL11202607

Nc1cc(NC(=O)c2ccccc2)ccc1O

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.62
PKM P14618 1/20 0.62
KCNK3 O14649 1/20 0.61
KCNK9 Q9NPC2 1/20 0.61
NPC1 O15118 6/20 0.57
RAB9A P51151 6/20 0.57
PTPN1 P18031 2/20 0.56
CA12 O43570 1/20 0.55
CA1 P00915 1/20 0.55
CA2 P00918 1/20 0.55
CA9 Q16790 1/20 0.55
PLAU P00749 1/20 0.55
SIRT1 Q96EB6 2/20 0.54
MEN1 O00255 2/20 0.54
KDM4E B2RXH2 2/20 0.54
POLB P06746 1/20 0.54
MAPT P10636 2/20 0.54
ACE2 Q9BYF1 1/20 0.54
TP53 P04637 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11197738 0.98 KMT2A (0.60) KMT2APKMKCNK3KCNK9NPC1
SCHEMBL23226872 0.91 DEGS1 (0.63) KMT2APTPN1MEN1KDM4EPOLB
SCHEMBL17267844 0.90 PKM (0.52) KMT2APKMKCNK3KCNK9NPC1
SCHEMBL17267854 0.89 KMT2A (0.55) KMT2APKMKCNK3KCNK9NPC1
SCHEMBL4409156 0.86 KCNK3 (0.65) KMT2APKMKCNK3KCNK9NPC1
SCHEMBL28307210 0.86 TOP1 (0.62) KMT2APKMNPC1RAB9ACA12
SCHEMBL11793228 0.84 KMT2A (0.73) KMT2APKMKCNK3KCNK9NPC1
SCHEMBL11192743 0.84 TRPV1 (0.53) KMT2APKMNPC1RAB9ACA12
SCHEMBL11193981 0.84 TP53 (0.63) KMT2APKMNPC1RAB9APLAU
SCHEMBL11191641 0.84 NPC1 (0.57) KMT2APKMKCNK3NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0083204-A2 2-Aminophenol derivatives and process for their preparation ONO PHARMACEUTICAL CO., LTD. (JP) 1983-07-06 EP claimed
US-9929348-B2 Organic semiconductor composition comprising organic semiconductor material and polymer compound FUJIFILM CORPORATION (JP) 2018-03-27 US disclosed
US-9343594-B2 Conductive composition, conductive member and production method thereof, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2016-05-17 US disclosed
CN-105579907-A Radiation-sensitive composition and pattern production method TOKYO OHKA KOGYO CO LTD 2016-05-11 CN disclosed
US-20160064674-A1 ORGANIC SEMICONDUCTOR COMOSITION, ORGANIC THIN-FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2016-03-03 US disclosed
US-9224518-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2015-12-29 US disclosed
US-20140202531-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE MEMBER AND PRODUCTION METHOD THEREOF, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-07-24 US disclosed
US-8420291-B2 Positive photosensitive resin composition, method for forming pattern, electronic component HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2013-04-16 US disclosed
US-20100258336-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, ELECTRONIC COMPONENT HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2010-10-14 US disclosed
EP-0083204-A2 2-Aminophenol derivatives and process for their preparation ONO PHARMACEUTICAL CO., LTD. (JP) 1983-07-06 EP disclosed