SCHEMBL11216591

SCHEMBL11216591

COc1ccc(-c2ncncn2)c2ccccc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.47
EP300 Q09472 1/20 0.46
KAT8 Q9H7Z6 1/20 0.46
IMPDH2 P12268 1/20 0.43
IMPDH1 P20839 1/20 0.43
MAPT P10636 5/20 0.43
LMNA P02545 2/20 0.43
NQO1 P15559 1/20 0.41
KMT2A Q03164 4/20 0.40
MEN1 O00255 3/20 0.40
HPGD P15428 2/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
HSD17B10 Q99714 2/20 0.40
ALDH1A1 P00352 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
PLK1 P53350 1/20 0.39
USP2 O75604 1/20 0.39
HSP90AA1 P07900 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29848197 1.00 IDO1 (0.47) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL9003937 0.84 IDO1 (0.46) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL174453 0.79 CYP1A2 (0.54) LMNAKMT2AMEN1HPGDSMN1; SMN2
SCHEMBL12019841 0.78 IDO1 (0.64) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL12019777 0.78 IDO1 (0.64) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL7753164 0.78 IDO1 (0.64) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL30628538 0.76 IDO1 (0.38) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL29380721 0.76 IDO1 (0.73) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL419307 0.76 IDO1 (0.73) IDO1EP300KAT8IMPDH2IMPDH1
SCHEMBL3628207 0.76 IDO1 (0.38) IDO1EP300KAT8IMPDH2IMPDH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110647010-B Resin composition, dry film, method for producing dry film, resist film, substrate, and method for producing plating molded article 东京应化工业株式会社 2024-02-09 CN disclosed
CN-117177962-A Triazine peroxide derivative and method for producing same, polymerizable composition, cured product, and method for producing cured product 日油株式会社 2023-12-05 CN disclosed
CN-109749733-B Quantum dot composition, quantum dot polymer composite, layered structure comprising the same, and electronic device 三星电子株式会社 2023-11-24 CN disclosed
CN-116635788-A Photosensitive dry film, laminated film, method for producing laminated film, and method for producing patterned resist film 东京应化工业株式会社 2023-08-22 CN disclosed
CN-109652076-B Composition, quantum dot polymer composite, layered structure including the same, and electronic device 三星电子株式会社 2023-07-14 CN disclosed
CN-108102640-B Quantum dots, compositions or composites comprising the same, and electronic devices comprising the same 三星电子株式会社 2023-06-09 CN disclosed
CN-116157739-A Chemically amplified photosensitive composition, photosensitive dry film, method for producing substrate with plating mold, and method for producing plating molded article 东京应化工业株式会社 2023-05-23 CN disclosed
CN-115612311-A Dye, composition comprising same, film, optical member, and display device 三星SDI株式会社 2023-01-17 CN disclosed
US-4350753-A Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff POLYCHROME CORPORATION (US) 1982-09-21 US disclosed