SCHEMBL11225504

SCHEMBL11225504

CCOC(=O)c1cc(Cl)ccc1Cl

nearest known ligand 0.67

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.67
CYP4A11 Q02928 1/20 0.67
KMT2A Q03164 2/20 0.55
MAPK1 P28482 1/20 0.54
ALDH1A1 P00352 4/20 0.53
TP53 P04637 2/20 0.53
TSHR P16473 2/20 0.53
ALOX15 P16050 1/20 0.51
TAS1R3 Q7RTX0 1/20 0.51
TAS1R1 Q7RTX1 1/20 0.51
KDM4E B2RXH2 2/20 0.50
MAPT P10636 2/20 0.50
HPGD P15428 1/20 0.50
BAZ2B Q9UIF8 1/20 0.50
BAZ2A Q9UIF9 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL235046 0.87 TSHR (0.60) CYP4F2CYP4A11KMT2AMAPK1ALDH1A1
SCHEMBL549144 0.86 MAPK1 (0.54) CYP4F2CYP4A11KMT2AMAPK1ALDH1A1
SCHEMBL522136 0.86 KMT2A (0.59) CYP4F2CYP4A11KMT2AMAPK1ALDH1A1
SCHEMBL2406530 0.86 CYP4F2 (0.67) CYP4F2CYP4A11KMT2AMAPK1ALDH1A1
SCHEMBL19971601 0.84 MAPK1 (0.52) CYP4F2CYP4A11KMT2AMAPK1TSHR
SCHEMBL3303821 0.84 CA1 (0.70) CYP4F2CYP4A11KMT2AMAPK1TSHR
SCHEMBL15465375 0.84 CA1 (0.70) CYP4F2CYP4A11KMT2AALDH1A1TSHR
SCHEMBL320406 0.84 CYP4F2 (0.79) CYP4F2CYP4A11KMT2AMAPK1ALDH1A1
SCHEMBL11797413 0.83 TSHR (0.58) CYP4F2CYP4A11KMT2AMAPK1ALDH1A1
SCHEMBL2033060 0.83 MAPK1 (0.51) CYP4F2CYP4A11KMT2AMAPK1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110088680-B Double-layer photosensitive layer roll 旭化成株式会社 2022-12-30 CN disclosed
CN-107329367-B Photosensitive resin composition, method for producing cured relief pattern, semiconductor device, and display device 旭化成株式会社 2021-03-23 CN disclosed
CN-108546232-B Preparation method of mono-substituted or di-substituted benzoate compound 湖北汇达科技发展有限公司 2020-10-16 CN disclosed
WO-2018057219-A1 METHOD OF ALLOCATING INDIVIDUAL OIL OR WATER PRODUCTION CONTRIBUTIONS FROM MULTIPLE COMBINED SOURCES SPECTRUM TRACER SERVICES, LLC (US) 2018-03-29 WO disclosed
US-20180080314-A1 METHOD OF ALLOCATING INDIVIDUAL OIL OR WATER PRODUCTION CONTRIBUTIONS FROM MULTIPLE COMBINED SOURCES SPECTRUM TRACER SERVICES, LLC 2018-03-22 US disclosed
US-20170102613-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE ASAHI KASEI E-MATERIALS CORPORATION (JP) 2017-04-13 US disclosed
US-9575410-B2 Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device ASAHI KASEI E-MATERIALS CORPORATION (JP) 2017-02-21 US disclosed
US-20140349222-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE ASAHI KASEI E-MATERIALS CORPORATION (JP) 2014-11-27 US disclosed
CN-101993537-A Alkali-soluble polymer, photosensitive resin composition comprising the same, and uses of the same ASAHI KASEI E MATERIALS CORP 2011-03-30 CN disclosed
US-4356295-A COORDINATION CATALYSTS MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1982-10-26 US disclosed
US-3966728-A ANTIPEPTIC ULCER ACTIVITY NIPPON SHINYAKU CO., LTD. (JA) 1976-06-29 US disclosed