Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL11226372

C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.C[N+](C)(C)C.O=P([O-])([O-])F.O=P([O-])([O-])F.O=P([O-])([O-])F.O=P([O-])([O-])F

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
SLC34A1 Q06495 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetramethylammonium Ion SCHEMBL10180356 1.00 CHRNB2 (0.33) CHRNB2CHRNA7CHRNA4SLC34A1
Tetramethylammonium Ion SCHEMBL10181373 0.92 CHRNB2 (0.33) CHRNB2CHRNA7CHRNA4SLC34A1
Tetramethylammonium Ion SCHEMBL545336 0.82 CHRNB2 (0.40) CHRNB2CHRNA7CHRNA4SLC34A1
Tetramethylammonium Ion SCHEMBL1130116 0.82 SLC34A1 (0.41) SLC34A1
Tetramethylammonium Ion SCHEMBL15924284 0.78 CHRNB2 (0.36) CHRNB2CHRNA7CHRNA4SLC34A1
Tetramethylammonium Ion SCHEMBL7641461 0.78 CHRNB2 (0.36) CHRNB2CHRNA7CHRNA4SLC34A1
Tetramethylammonium Ion SCHEMBL1204834 0.78 CHRNB2 (0.36) CHRNB2CHRNA7CHRNA4SLC34A1
SCHEMBL23037338 0.77 SLC34A1 (0.39) SLC34A1
SCHEMBL23037334 0.77 SLC34A1 (0.39) SLC34A1
Silver SCHEMBL20593984 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11352593-B2 Aqueous composition and cleaning method using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-06-07 US disclosed
US-20210155881-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-05-27 US disclosed
EP-3787010-A1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-03 EP disclosed
CN-112041970-A Aqueous composition and cleaning method using the same 三菱瓦斯化学株式会社 2020-12-04 CN disclosed
US-4313843-A CHEMILUMINESCENT HAVING GOOD STORAGE STABILITY AMERICAN CYANAMID COMPANY (US) 1982-02-02 US disclosed