Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC34A1 | Q06495 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | BBOX1 | O75936 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL6544920 | 0.91 | SLC34A1 (0.35) | SLC34A1CA2 | |
| Tetramethylammonium Ion SCHEMBL28726648 | 0.89 | CA2 (0.43) | SLC34A1CA2BBOX1LMNA | |
| Tetramethylammonium Ion SCHEMBL36639 | 0.82 | SLC34A1 (0.50) | SLC34A1CA2BBOX1KDM4ECYP2C19 | |
| Tetramethylammonium Ion SCHEMBL11226372 | 0.82 | CHRNB2 (0.33) | SLC34A1 | |
| Tetramethylammonium Ion SCHEMBL10180356 | 0.82 | CHRNB2 (0.33) | SLC34A1 | |
| Tetramethylammonium Ion SCHEMBL36640 | 0.82 | SLC34A1 (0.61) | SLC34A1CA2BBOX1KDM4ECYP2C19 | |
| Tetramethylammonium Ion SCHEMBL27859839 | 0.82 | CA2 (0.43) | SLC34A1CA2BBOX1LMNA | |
| Tetramethylammonium Ion SCHEMBL10181373 | 0.82 | CHRNB2 (0.33) | SLC34A1 | |
| SCHEMBL3628035 | 0.80 | SLC34A1 (0.41) | SLC34A1CA2KDM4ECYP2C19KMT2A | |
| Tetramethylammonium Ion SCHEMBL6320658 | 0.79 | SLC34A1 (0.47) | SLC34A1CA2BBOX1KDM4ECYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200303086-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-09-24 | — | — | US | disclosed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-20170309363-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2017-10-26 | — | — | US | disclosed |
| EP-2762976-A1 | Use of immersion liquids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-08-06 | — | — | EP | disclosed |
| EP-1557721-B1 | Use of fluids for immersion lithography and pattern forming method | AIR PROD & CHEM (US) | 2014-08-06 | — | — | EP | disclosed |
| US-8007986-B2 | Immersion lithography fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-08-30 | — | — | US | disclosed |
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7879531-B2 | Immersion lithography fluids | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-02-01 | — | — | US | disclosed |
| EP-2012198-B1 | METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER | FUJIFILM CORP (JP) | 2010-11-24 | — | — | EP | disclosed |
| US-20100061212-A1 | METHOD AND DEVICE FOR OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDING AND REPRODUCING APPARATUS | FUJIFILM CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20030187119-A1 | Radiation-sensitive composition capable of having refractive index distribution | JSR CORPORATION (JP) | 2003-10-02 | — | — | US | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1331518-A2 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR Corporation (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |