SCHEMBL11227634

SCHEMBL11227634

O=C(O)C(CBr)(CBr)CBr

nearest known ligand 0.41

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.41
ALDH1A1 P00352 6/20 0.33
TP53 P04637 1/20 0.33
TRPA1 O75762 1/20 0.32
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30
HIF1A Q16665 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3868579 0.82 TSHR (0.33) TSHRALDH1A1TRPA1CYP2D6CYP2C19
SCHEMBL8030539 0.82 TSHR (0.33) TSHRALDH1A1TRPA1CYP2D6CYP2C19
SCHEMBL6843155 0.74 AKR1B1 (0.36) TSHRALDH1A1
SCHEMBL22286374 0.74 MEN1 (0.33) ALDH1A1
SCHEMBL25269846 0.69
SCHEMBL11225576 0.69 TSHR (0.32) TSHRALDH1A1TP53TRPA1CYP2C19
SCHEMBL30970937 0.69 TSHR (0.39) TSHRALDH1A1TP53TRPA1
SCHEMBL791722 0.67
SCHEMBL314782 0.67
SCHEMBL9447384 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122006297-A Powder defoaming agent with lasting foam inhibition performance and preparation method thereof 江苏赛欧信越消泡剂有限公司 2026-05-12 CN claimed
CN-122103193-A Quaternary ammonium salt cationic surfactant, preparation method thereof and application thereof in de-scaling glass water 2026-05-29 CN disclosed
CN-122006297-A Powder defoaming agent with lasting foam inhibition performance and preparation method thereof 江苏赛欧信越消泡剂有限公司 2026-05-12 CN disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
CN-115584257-A Quantum dot, ink composition, light-emitting device, optical member, and device 三星显示有限公司 2023-01-10 CN disclosed
US-4360609-A VINYLAROMATIC POLYMER, ACTIVE ALLYL OR BENZYL CARBON, ARYLSULFONATE CATALYST THE DOW CHEMICAL COMPANY (US) 1982-11-23 US disclosed
US-RE30497-E HALOGENATED COMPOUND, ELEMENTAL PHOSPHORUS THE DOW CHEMICAL COMPANY (US) 1981-01-27 US disclosed
US-4086192-A Olefin polymer composition having reduced flame propagation characteristics THE DOW CHEMICAL COMPANY (US) 1978-04-25 US disclosed
US-4038245-A CHAR-FORMING POLYMER COMPOSITIONS THE DOW CHEMICAL COMPANY (US) 1977-07-26 US disclosed
US-4012343-A PHOSPHORUS, HALOGENATED COMPOUND THE DOW CHEMICAL COMPANY (US) 1977-03-15 US disclosed