SCHEMBL11244035

SCHEMBL11244035

C=CCOCC=C.[Ti]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15584 0.96
SCHEMBL15068452 0.96 CA1 (0.46)
SCHEMBL4729227 0.92
SCHEMBL9358622 0.92
SCHEMBL324713 0.92
SCHEMBL6531312 0.92
SCHEMBL3265050 0.92
Strontium SCHEMBL10626900 0.92
SCHEMBL6537240 0.92
SCHEMBL14995323 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108660442-B LaxTiyOzOxide comprising the LaxTiyOzComposite material of oxide and preparation method thereof 东南大学 2020-10-02 CN claimed
CN-105623382-A Ink-jet ink containing metal alkoxide sol CRE INKJET TECH CO LTD 2016-06-01 CN claimed
US-4336319-A Light-solubilizable composition FUJI PHOTO FILM CO., LTD. (JP) 1982-06-22 US claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4700067-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-25 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260029706-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-29 US disclosed
EP-4621486-A2 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
US-20250289931-A1 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-18 US disclosed
EP-4592299-A1 SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-30 EP disclosed
CN-105623382-A Ink-jet ink containing metal alkoxide sol CRE INKJET TECH CO LTD 2016-06-01 CN disclosed
US-20140291591-A1 NANOCOMPOSITE STRUCTURE, ELECTRODE INCLUDING THE NANOCOMPOSITE STRUCTURE, MANUFACTURING METHOD OF THE ELECTRODE, AND ELECTROCHEMICAL DEVICE INCLUDING THE ELECTRODE INTELLECTUAL DISCOVERY CO., LTD. (KR) 2014-10-02 US disclosed
CN-101292309-B Electrode structure, capacitor and method for producing electrode structure TOYO ALUMINIUM KK 2011-03-16 CN disclosed
CN-100469814-C Polyester resin compositions, catalyst for polyester production, polyester film, and magnetic recording medium TORAY INDUSTRIES (JP) 2009-03-18 CN disclosed
CN-101292309-A Electrode structure, capacitor and method for producing electrode structure TOYO ALUMINIUM KK (JP) 2008-10-22 CN disclosed
CN-100373264-C Electrophotographic photoreceptor, electrophotographic member, process cartridge and image forming apparatus FUJI XEROX CO LTD (JP) 2008-03-05 CN disclosed
CN-1703440-A Polyester resin compositions, catalyst for polyester production, polyester film, and magnetic recording medium TORAY INDUSTRIES (JP) 2005-11-30 CN disclosed
CN-1467571-A Electrophotographic photoreceptor, electrophotographic member, process cartridge and image forming apparatus 富士施乐株式会社 2004-01-14 CN disclosed
US-4336319-A Light-solubilizable composition FUJI PHOTO FILM CO., LTD. (JP) 1982-06-22 US disclosed