SCHEMBL6531312

SCHEMBL6531312

C=CCOCC=C.[Al]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11393299 0.96
SCHEMBL15068452 0.96 CA1 (0.46)
SCHEMBL15584 0.96
SCHEMBL4729227 0.92
SCHEMBL6537240 0.92
SCHEMBL9358622 0.92
Strontium SCHEMBL10626900 0.92
SCHEMBL11244035 0.92
SCHEMBL324713 0.92
SCHEMBL3265050 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117624472-A Polymerization hydrogenation process of cycloolefin monomer 杭州睿丰融创科技有限公司 2024-03-01 CN claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4700067-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-25 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260029706-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-29 US disclosed
US-20250383481-A1 LIGHT ABSORBER, LIGHT-ABSORBING COMPOUND, LIGHT-ABSORBING COMPOUND DISPERSION, LIGHT-ABSORBING COMPOSITION, OPTICAL FILTER, PHOTOELECTRIC CONVERSION ELEMENT, AMBIENT LIGHT SENSOR, AND IMAGING APPARATUS NIPPON SHEET GLASS CO LTD (JP) 2025-12-18 US disclosed
EP-4621486-A2 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
US-20250289931-A1 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-18 US disclosed
EP-4592299-A1 SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-30 EP disclosed
US-20150148503-A1 NOVEL BIMETALLIC COBALT-ALUMINUM ADDUCT CATALYST SYSTEM FOR PREPARING HIGH TRANS-1,4-POLYBUTADIENE KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2015-05-28 US disclosed
CN-102449057-B Polymer composition for crosslinked pipes BOREALIS AG 2015-03-25 CN disclosed
CN-102449056-B Polymer composition for crosslinked articles BOREALIS AG 2015-03-25 CN disclosed
JP-2005049356-A DETECTOR AND METHOD FOR DETECTING ANALYTE BY LIGHT INTERFERENCE THERMO ELECTRON CORP-POINT OF CARE RAPID DIAGNOSTICS 2005-02-24 JP disclosed
CN-1217685-A VULCANIZED MOLDING HAVING SURFACE DECORATIVE LAYER, PAINTED THERMOPLASTIC RESIN COMPOSITION AND PAINTED ELASTOMER COMPOSITION MITSUI CHEMICALS INC (JP) 1999-05-26 CN disclosed
CN-1216055-A RUBBER COMPOSITIONS FOR TIRES MITSUI CHEMICALS INC (JP) 1999-05-05 CN disclosed
CN-1013580-B PROCESS FOR POLYMERIZATING OLEFINE MITSUI PETROCHEMICAL IND (JP) 1991-08-21 CN disclosed
US-4775503-A USING CORDIERITE INTERCONNEXIONS CERAMIQUES (FR) 1988-10-04 US disclosed
US-4207205-A TITANIUM TETRACHLORIDE, ALPHA-OLEFIN POLYMERIZATION CATALYST EXXON RESEARCH & ENGINEERING CO. (US) 1980-06-10 US disclosed
US-3994944-A Method for making alkyl tin trichlorides SCHERING AKTIENGESELLSCHAFT (DT) 1976-11-30 US disclosed