Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | CA5A | P35218 | 2/20 | 0.42 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | NT5E | P21589 | 1/20 | 0.36 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
| ▸ | CA6 | P23280 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL1691981 | 1.00 | CA2 (0.50) | CA2TSHRTDP1CA5ACA5B | |
| Ammonia Solution, Strong SCHEMBL29752566 | 1.00 | CA2 (0.50) | CA2TSHRTDP1CA5ACA5B | |
| Ammonia Solution, Strong SCHEMBL9613881 | 0.96 | CA2 (0.47) | CA2TSHRTDP1CA5ACA5B | |
| Sulfuric Acid SCHEMBL11682569 | 0.96 | CA5A (0.50) | CA2TSHRTDP1CA5ACA5B | |
| SCHEMBL3781 | 0.95 | — | — | |
| SCHEMBL56331 | 0.95 | CA2 (0.54) | CA2TSHRTDP1CA5ACA5B | |
| Hydroxyamine SCHEMBL11041757 | 0.92 | CA2 (0.44) | CA2TSHRTDP1CA5ACA5B | |
| Ammonia Solution, Strong SCHEMBL11669799 | 0.92 | CA2 (0.44) | CA2TSHRTDP1CA5ACA5B | |
| Hydroxyamine SCHEMBL11041766 | 0.92 | CA2 (0.44) | CA2TSHRTDP1CA5ACA5B | |
| Water SCHEMBL10934974 | 0.91 | CA2 (0.50) | CA2TSHRTDP1CA5ACA5B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110219180-A | A kind of base fabric processing technology of superfine fiber chemical leather | 浙江永祥合成材料有限公司 | 2019-09-10 | — | — | CN | claimed |
| CN-101560151-B | Process for continuously generating methyl acetate by reactive distillation taking ionic liquid as catalyst | NANJING UNIVERSITY OF TECHNOLOGY | 2012-10-17 | — | — | CN | claimed |
| US-4351776-A | Preparation of iodophthalonitrile | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1982-09-28 | — | — | US | claimed |
| CN-111348687-B | Crystal material, preparation method and application thereof, sodium ion battery positive electrode material, sodium ion battery and equipment | 深圳先进技术研究院 | 2023-02-10 | — | — | CN | disclosed |
| CN-111348687-A | Crystal material, preparation method and application thereof, sodium ion battery positive electrode material, sodium ion battery and equipment | 深圳先进技术研究院 | 2020-06-30 | — | — | CN | disclosed |
| CN-110219180-A | A kind of base fabric processing technology of superfine fiber chemical leather | 浙江永祥合成材料有限公司 | 2019-09-10 | — | — | CN | disclosed |
| CN-104821337-B | The thin film transistor base plate and its manufacturing method for having protective film | 国立大学法人奈良先端科学技术大学院大学 | 2019-04-19 | — | — | CN | disclosed |
| CN-106750399-B | A kind of selfreparing, photaesthesia aquagel and preparation method thereof | 盐城工学院 | 2019-01-25 | — | — | CN | disclosed |
| CN-106978534-B | A kind of method that substep dynamic adjusts acid extraction molybdenum | 河北欣芮再生资源利用有限公司 | 2018-09-25 | — | — | CN | disclosed |
| CN-104870527-B | Composite of metal oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using same | AZ电子材料（卢森堡）有限公司 | 2018-04-13 | — | — | CN | disclosed |
| CN-107847479-A | For treating the preparaton of acne | 阿克苏诺贝尔化学品国际有限公司 | 2018-03-27 | — | — | CN | disclosed |
| CN-101133366-A | Developer composition, process for producing the same, and process for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2008-02-27 | — | — | CN | disclosed |
| CN-101032015-A | Metal interconnect feature cap on an integrated circuit of an electronic device | ENTHONE (US) | 2007-09-05 | — | — | CN | disclosed |
| CN-101013265-A | Method of forming corrosion-resistant pattern and method of manufacturing semiconductor device | RENESAS TECH CORP (JP) | 2007-08-08 | — | — | CN | disclosed |
| CN-1943018-A | Polishing slurry | MITSUI CHEMICALS INC (JP) | 2007-04-04 | — | — | CN | disclosed |
| CN-1802609-A | Developer composition for resists and method for formation of resist pattern | TOKYO OHKA KOGYO LTD (JP) | 2006-07-12 | — | — | CN | disclosed |
| CN-1214292-C | Forming method for photoresist design and its laminating products | TOKYO OKA GOGYO K K (JP) | 2005-08-10 | — | — | CN | disclosed |
| CN-1120180-C | Preparation of aqueous polymer dispersions | BASF AG (DE) | 2003-09-03 | — | — | CN | disclosed |
| CN-1424626-A | Forming method for photoresist design and its laminating products | TOKYO OKA GOGYO K K (JP) | 2003-06-18 | — | — | CN | disclosed |
| CN-1151747-A | Preparation of aqueous polymer dispersions | BASF AG (DE) | 1997-06-11 | — | — | CN | disclosed |