SCHEMBL11275427

SCHEMBL11275427

CC1CC2OC2CC1C(=O)OCCOC(=O)C1CC2OC2CC1C

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 2/20 0.39
PTPN1 P18031 2/20 0.39
PPP1CC P36873 2/20 0.39
ALDH1A1 P00352 3/20 0.38
PPP5C P53041 1/20 0.34
POLB P06746 1/20 0.33
KDM4E B2RXH2 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.32
NPC1 O15118 4/20 0.31
RAB9A P51151 4/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
GAA P10253 2/20 0.31
MEN1 O00255 1/20 0.31
MAPT P10636 1/20 0.31
NFKB1 P19838 1/20 0.31
MAPK1 P28482 1/20 0.31
NFKB2 Q00653 1/20 0.31
KMT2A Q03164 1/20 0.31
RELA Q04206 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL258870 0.95 PPM1B (0.36) PPM1BPTPN1PPP1CCALDH1A1PPP5C
SCHEMBL13935464 0.91 PPM1B (0.50) PPM1BPTPN1PPP1CCALDH1A1KDM4E
SCHEMBL2322393 0.89 PPM1B (0.41) PPM1BPTPN1PPP1CCALDH1A1PPP5C
SCHEMBL14279357 0.88 THRB (0.41) PPM1BPTPN1PPP1CCALDH1A1POLB
SCHEMBL2320405 0.87 PPM1B (0.47) PPM1BPTPN1PPP1CCALDH1A1KDM4E
SCHEMBL28435902 0.87 PPM1B (0.37) PPM1BPTPN1PPP1CCALDH1A1
SCHEMBL14590627 0.87 PPM1B (0.32) PPM1BPTPN1PPP1CCALDH1A1
SCHEMBL22534510 0.86 NAAA (0.45) PPM1BPTPN1PPP1CC
SCHEMBL13390750 0.86 PPM1B (0.33) PPM1BPTPN1PPP1CCALDH1A1
SCHEMBL9910595 0.86 NAAA (0.45) PPM1BPTPN1PPP1CC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12168737-B2 Matting agent including polymer particles, matting polymer composition including matting agent, and method of producing polymer particles HANNANOTECH CO., LTD. (KR) 2024-12-17 US claimed
CN-115746489-A Matte polymer composition having excellent weather resistance and impact resistance, and matte sheet comprising same 韩纳米技术株式会社 2023-03-07 CN claimed
CN-115725025-A Matting agent comprising emulsion polymer particles, matting polymer composition comprising the matting agent, and method for producing the same 韩纳米技术株式会社 2023-03-03 CN claimed
US-20250051590-A1 MATTING AGENT INCLUDING POLYMER PARTICLES, MATTING POLYMER COMPOSITION INCLUDING MATTING AGENT, AND METHOD OF PRODUCING POLYMER PARTICLES HANNANOTECH CO., LTD. (KR) 2025-02-13 US disclosed
US-20230073124-A1 MATTING AGENT INCLUDING POLYMER PARTICLES, MATTING POLYMER COMPOSITION INCLUDING MATTING AGENT, AND METHOD OF PRODUCING POLYMER PARTICLES HANNANOTECH CO., LTD. (KR) 2023-03-09 US disclosed
CN-115746489-A Matte polymer composition having excellent weather resistance and impact resistance, and matte sheet comprising same 韩纳米技术株式会社 2023-03-07 CN disclosed
CN-115725014-A Matting agent comprising polymer particles, matting polymer composition comprising the matting agent, and method for producing the same 韩纳米技术株式会社 2023-03-03 CN disclosed
CN-115725025-A Matting agent comprising emulsion polymer particles, matting polymer composition comprising the matting agent, and method for producing the same 韩纳米技术株式会社 2023-03-03 CN disclosed
US-4337330-A EPOXY RESINS; CONTROLLED EXTRACTABILITY AND WATER DISSOLUTION RATE UNION CARBIDE CORPORATION (US) 1982-06-29 US disclosed
US-4173690-A Method of producing electrical insulation foam GOULD INC. (US) 1979-11-06 US disclosed
US-4066628-A REACTING ORGANIC ISOCYANATE WITH AN EPOXIDE MITSUBISHI CHEMICAL INDUSTRIES LTD. (JA) 1978-01-03 US disclosed