SCHEMBL1127828

SCHEMBL1127828

C=CC(CCO)OC(C=C)CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL891346 0.84
SCHEMBL1576324 0.82
SCHEMBL15698308 0.81
SCHEMBL13013786 0.79
SCHEMBL18085187 0.77
SCHEMBL16940577 0.77
SCHEMBL2836895 0.77 TSHR (0.32)
Ethylene Glycol SCHEMBL11497946 0.75 LMNA (0.39)
SCHEMBL13633223 0.75
SCHEMBL10714976 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1966253-B1 CURABLE FLUORINATED COPOLYMERS AND COATINGS AND PROCESSES THEREOF LANXESS DEUTSCHLAND GMBH (DE) 2015-08-12 EP claimed
US-4250240-A Photosensitive material for use in electrophotography RICOH COMPANY, LTD. (JP) 1981-02-10 US claimed
US-20240351939-A1 SUBSTRATE FOR MOUNTING LED AND LED-MOUNTED SUBSTRATE TAIYO HOLDINGS CO., LTD. (JP) 2024-10-24 US disclosed
EP-3604454-B1 COATED PIGMENT, AQUEOUS PIGMENT DISPERSION, USE THEREOF, AND PRODUCTION METHOD THEREFOR ARTIENCE CO LTD (JP) 2024-08-07 EP disclosed
EP-3235842-B2 SELF-REPAIRING POLYURETHANE RESIN MATERIAL, SELF-REPAIRING POLYURETHANE RESIN, SELF-REPAIRING COATING MATERIAL, SELF-REPAIRING ELASTOMER MATERIAL, METHOD FOR PRODUCING SELF-REPAIRING POLYURETHANE RESIN MATERIAL, AND METHOD FOR PRODUCING SELF-REPAIRING POLYURETHANE RESIN MITSUI CHEMICALS INC (JP) 2023-10-11 EP disclosed
US-20230078175-A1 ACTIVE ENERGY RAY-CURABLE POLYURETHANE RESIN, CURABLE RESIN COMPOSITION, AND PRODUCTION METHOD FOR ACTIVE ENERGY RAY-CURABLE POLYURETHANE RESIN MITSUI CHEMICALS, INC. (JP) 2023-03-16 US disclosed
EP-4130085-A1 ACTIVE ENERGY RAY-CURABLE POLYURETHANE RESIN, CURABLE RESIN COMPOSITION, AND PRODUCTION METHOD FOR ACTIVE ENERGY RAY-CURABLE POLYURETHANE RESIN Mitsui Chemicals, Inc. (JP) 2023-02-08 EP disclosed
CN-112839992-B Composition, fluoropolymer, and coating containing same AGC株式会社 2023-02-03 CN disclosed
CN-112272606-B Active energy ray-curable resin composition for three-dimensional modeling support material, and ink 科巨希化学股份有限公司 2023-01-24 CN disclosed
US-11254638-B2 Nitrileoxide compound DAIKIN INDUSTRIES, LTD. (JP) 2022-02-22 US disclosed
CN-110536939-B Fluorine-based paint, method for producing fluorine-based paint, coated article, and method for producing coated article AGC株式会社 2021-08-03 CN disclosed
WO-2001040336-A2 AQUEOUS DISPERSIONS OF ACRYLATE MODIFIED ALKYD RESINS AND USE THEREOF BASF COATINGS AG (DE) 2001-06-07 WO disclosed
US-6051665-A A FLUOROPOLYMER IS OBTAINED FROM THE MONOMER SELECTED FROM THE GROUP CONTAINING A FLUORO-OLEFIN, A FLUORO VINYL ETHER, A FLUORO (METH) ACRYLATE AND MIXTURE, ALSO CONTAIN HYDROLYZABLE SILYL GROUP, A SILOXY COMPOUND AND A CHELATE COMPLEX JSR CORPORATION (JP) 2000-04-18 US disclosed
EP-0953601-A1 AQUEOUS EMULSION CONTAINING FINE PARTICLES OF CROSS-LINKED ALLYLIC COPOLYMER DAISO CO., LTD. (JP) 1999-11-03 EP disclosed
EP-0567154-B1 Fluorine-containing coating composition ASAHI GLASS CO LTD (JP) 1996-07-31 EP disclosed
EP-0566954-B1 Process for the preparation of isocyanate-prepolymers and their use in the production of coating agents BAYER AG (DE) 1996-06-12 EP disclosed
US-5349031-A Weatherproof, acid resistance ASAHI GLASS COMPANY LTD. (JP) 1994-09-20 US disclosed
EP-0566954-A1 Process for the preparation of isocyanate-prepolymers and their use in the production of coating agents BAYER AG (DE) 1993-10-27 EP disclosed
EP-0567154-A1 Fluorine-containing coating composition ASAHI GLASS COMPANY LTD. (JP) 1993-10-27 EP disclosed
US-4418207-A Acetylacetoxyalkyl-allyl ethers HOECHST AKTIENGESELLSCHAFT (DE) 1983-11-29 US disclosed