SCHEMBL1127834

SCHEMBL1127834

CC(C)(C)OC(=O)CCN1CCOCC1

nearest known ligand 0.57

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.57
GLA P06280 1/20 0.53
USP2 O75604 1/20 0.50
KMT2A Q03164 6/20 0.47
MEN1 O00255 2/20 0.47
ALDH1A1 P00352 4/20 0.44
MAPT P10636 4/20 0.44
CD274 Q9NZQ7 1/20 0.43
RAB9A P51151 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
PAOX Q6QHF9 1/20 0.41
LMNA P02545 1/20 0.41
MPI P34949 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27055095 0.87 PAOX (0.50) SMN1; SMN2GLAUSP2KMT2AMEN1
SCHEMBL530405 0.85 KDM4E (0.47) SMN1; SMN2GLAUSP2KMT2AMEN1
SCHEMBL17420838 0.84 SMN1; SMN2 (0.41) SMN1; SMN2GLAUSP2KMT2AMEN1
SCHEMBL12014400 0.84 ALDH1A1 (0.48) SMN1; SMN2USP2KMT2AMEN1ALDH1A1
SCHEMBL12014399 0.82 ALDH1A1 (0.52) SMN1; SMN2USP2KMT2AMEN1ALDH1A1
SCHEMBL12014405 0.82 SMN1; SMN2 (0.53) SMN1; SMN2USP2KMT2AMEN1ALDH1A1
SCHEMBL1128504 0.82 TP53 (0.48) SMN1; SMN2ALDH1A1MAPTPAOXLMNA
SCHEMBL25404852 0.81 SMN1; SMN2 (0.51) SMN1; SMN2USP2KMT2AMEN1ALDH1A1
SCHEMBL15068058 0.81 SMN1; SMN2 (0.56) SMN1; SMN2USP2KMT2AMEN1ALDH1A1
SCHEMBL66238 0.80 GLA (0.58) SMN1; SMN2GLAKMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3415151-A1 MODIFIED DRUGS FOR USE IN LIPOSOMAL NANOPARTICLES The University of British Columbia (CA) 2018-12-19 EP disclosed
EP-2282724-B1 MODIFIED DRUGS FOR USE IN LIPOSOMAL NANOPARTICLES UNIV BRITISH COLUMBIA (CA) 2018-09-05 EP disclosed
US-9968554-B2 Modified drugs for use in liposomal nanoparticles THE UNIVERSITY OF BRITISH COLUMBIA (CA) 2018-05-15 US disclosed
US-9651864-B2 Negative resist composition, method for producing relief pattern using the same, and electronic component using the same DAI NIPPON PRINTING CO., LTD. (JP) 2017-05-16 US disclosed
US-20140356417-A1 MODIFIED DRUGS FOR USE IN LIPOSOMAL NANOPARTICLES THE UNIVERSITY OF BRITISH COLUMBIA (CA) 2014-12-04 US disclosed
US-20140356417-A1 MODIFIED DRUGS FOR USE IN LIPOSOMAL NANOPARTICLES THE UNIVERSITY OF BRITISH COLUMBIA (CA) 2014-12-04 US disclosed
US-8790691-B2 Modified drugs for use in liposomal nanoparticles THE UNIVERSITY OF BRITISH COLUMBIA (CA) 2014-07-29 US disclosed
US-8790691-B2 Modified drugs for use in liposomal nanoparticles THE UNIVERSITY OF BRITISH COLUMBIA (CA) 2014-07-29 US disclosed
US-8728707-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-20 US disclosed
US-8728707-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-20 US disclosed
US-7759047-B2 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-20 US disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed
WO-2009141738-A2 MODIFIED DRUGS FOR USE IN LIPOSOMAL NANOPARTICLES THE UNIVERSITY OF BRITISH COLUMBIA (CA) 2009-11-26 WO disclosed
US-20090208867-A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed
US-20090208867-A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140356417-A1 MODIFIED DRUGS FOR USE IN LIPOSOMAL NANOPARTICLES ABCB11, SLC47A1, ABCB1 SMN1; SMN2 985/4885GLA 1510/4885USP2 4661/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.