⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11279692 | 0.93 | FDPS (0.32) | — | |
| SCHEMBL5528191 | 0.85 | FDPS (0.35) | — | |
| SCHEMBL27712336 | 0.81 | FDPS (0.33) | — | |
| Ammonia Solution, Strong SCHEMBL5924726 | 0.81 | FDPS (0.33) | — | |
| SCHEMBL27316692 | 0.80 | FDPS (0.37) | — | |
| Hydrochloric Acid SCHEMBL28785570 | 0.78 | FDPS (0.36) | — | |
| Water SCHEMBL28307903 | 0.78 | FDPS (0.36) | — | |
| SCHEMBL28228651 | 0.78 | FDPS (0.36) | — | |
| SCHEMBL5531248 | 0.76 | — | — | |
| SCHEMBL24286886 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260085408-A1 | SHIELDING COMPOUND, METHOD OF FORMING THIN FILM USING SHIELDING COMPOUND, AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE FABRICATED USING METHOD | SOULBRAIN CO LTD (KR) | 2026-03-26 | — | — | US | disclosed |
| US-20250376765-A1 | FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE | SOULBRAIN CO LTD (KR) | 2025-12-11 | — | — | US | disclosed |
| CN-120077464-A | Masking compound, method for forming thin film using the same, semiconductor substrate manufactured thereby, and semiconductor device | 秀博瑞殷株式公社 | 2025-05-30 | — | — | CN | disclosed |
| US-20250019827-A1 | FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE | SOULBRAIN CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-20250003067-A1 | FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD | SOULBRAIN CO., LTD. (KR) | 2025-01-02 | — | — | US | disclosed |
| CN-118234890-A | Film quality improver, method for forming thin film using same, semiconductor substrate manufactured thereby, and semiconductor device | 秀博瑞殷株式公社 | 2024-06-21 | — | — | CN | disclosed |
| CN-101607857-A | The manufacture method of alcohols | TORAY FINE CHEMICAL CO LTD (JP) | 2009-12-23 | — | — | CN | disclosed |
| US-4328380-A | Substituted phenylpropyl halides | BASF AKTIENGESELLSCHAFT (DE) | 1982-05-04 | — | — | US | disclosed |
| EP-0009077-B1 | SUBSTITUTED PHENYLPROPYL HALIDES, THEIR PREPARATION AND USE | BASF Aktiengesellschaft (DE) | 1981-09-30 | — | — | EP | disclosed |
| US-4250123-A | CHEMICAL INTERMEDIATES FOR FUNGICIDES | BASF AKTIENGESELLSCHAFT (DE) | 1981-02-10 | — | — | US | disclosed |
| EP-0009077-A1 | Substituted phenylpropyl halides, their preparation and use | BASF Aktiengesellschaft (DE) | 1980-04-02 | — | — | EP | disclosed |
| US-4046819-A | Alkylation of alkyl, cycloalkyl and aralkyl halides | UOP INC. (US) | 1977-09-06 | — | — | US | disclosed |