SCHEMBL5528191

SCHEMBL5528191

CCCC(Cl)(CCC)CCC

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
FDPS P14324 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27712336 0.96 FDPS (0.33) FDPS
Ammonia Solution, Strong SCHEMBL5924726 0.96 FDPS (0.33) FDPS
SCHEMBL27810873 0.87 FDPS (0.37) FDPS
SCHEMBL11279692 0.85 FDPS (0.32) FDPS
SCHEMBL11284644 0.85
SCHEMBL15901153 0.84 FDPS (0.39) FDPS
SCHEMBL11287846 0.80
SCHEMBL3907353 0.79 FDPS (0.35) FDPS
SCHEMBL8114941 0.79 FDPS (0.40) FDPS
SCHEMBL219084 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260085408-A1 SHIELDING COMPOUND, METHOD OF FORMING THIN FILM USING SHIELDING COMPOUND, AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE FABRICATED USING METHOD SOULBRAIN CO LTD (KR) 2026-03-26 US disclosed
US-20250376765-A1 FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE SOULBRAIN CO LTD (KR) 2025-12-11 US disclosed
CN-120077464-A Masking compound, method for forming thin film using the same, semiconductor substrate manufactured thereby, and semiconductor device 秀博瑞殷株式公社 2025-05-30 CN disclosed
US-20250019827-A1 FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE SOULBRAIN CO., LTD. (KR) 2025-01-16 US disclosed
US-20250003067-A1 FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD SOULBRAIN CO., LTD. (KR) 2025-01-02 US disclosed
CN-118234890-A Film quality improver, method for forming thin film using same, semiconductor substrate manufactured thereby, and semiconductor device 秀博瑞殷株式公社 2024-06-21 CN disclosed
CN-117941031-A Film quality improver, method for forming thin film using same, and semiconductor substrate produced thereby 秀博瑞殷株式公社 2024-04-26 CN disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
US-4328380-A Substituted phenylpropyl halides BASF AKTIENGESELLSCHAFT (DE) 1982-05-04 US disclosed
EP-0009077-B1 SUBSTITUTED PHENYLPROPYL HALIDES, THEIR PREPARATION AND USE BASF Aktiengesellschaft (DE) 1981-09-30 EP disclosed
US-4250123-A CHEMICAL INTERMEDIATES FOR FUNGICIDES BASF AKTIENGESELLSCHAFT (DE) 1981-02-10 US disclosed
EP-0009077-A1 Substituted phenylpropyl halides, their preparation and use BASF Aktiengesellschaft (DE) 1980-04-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260085408-A1 SHIELDING COMPOUND, METHOD OF FORMING THIN FILM USING SHIELDING COMPOUND, AND SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE FABRICATED USING METHOD SIK2, SIK3, MSI2 FDPS 3976/4885
US-20250003067-A1 FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD TET2, SMURF1, ACTR5 FDPS 748/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.