SCHEMBL1128535

SCHEMBL1128535

O=C(C[n+]1cccc2ccccc21)c1ccccc1

nearest known ligand 0.97

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 9/20 0.97
MEN1 O00255 7/20 0.97
ALDH1A1 P00352 4/20 0.97
KDM4E B2RXH2 6/20 0.75
ATM Q13315 1/20 0.72
HTT P42858 2/20 0.68
MITF O75030 1/20 0.68
MAPT P10636 1/20 0.68
HPGD P15428 2/20 0.63
APOBEC3A P31941 2/20 0.63
APOBEC3G Q9HC16 2/20 0.63
SMN1; SMN2 Q16637 2/20 0.59
LMNA P02545 1/20 0.59
ALPG P10696 1/20 0.59
USP2 O75604 1/20 0.58
KEAP1 Q14145 1/20 0.58
NFE2L2 Q16236 1/20 0.58
RECQL P46063 1/20 0.57
BCHE P06276 4/20 0.50
ACHE P22303 4/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30636590 1.00 KMT2A (0.97) KMT2AMEN1ALDH1A1KDM4EATM
Bromide SCHEMBL6228650 0.98 KMT2A (1.00) KMT2AMEN1ALDH1A1KDM4EATM
SCHEMBL18320467 0.94 KMT2A (0.85) KMT2AMEN1ALDH1A1KDM4EATM
SCHEMBL13119940 0.87 KMT2A (0.97) KMT2AMEN1ALDH1A1KDM4EATM
Bromide SCHEMBL3624435 0.86 KMT2A (1.00) KMT2AMEN1ALDH1A1KDM4EATM
Bromide SCHEMBL5257467 0.86 KMT2A (1.00) KMT2AMEN1ALDH1A1KDM4EATM
Bromide SCHEMBL5258726 0.86 KMT2A (0.78) KMT2AMEN1ALDH1A1KDM4EATM
Bromide SCHEMBL5256188 0.82 KMT2A (0.73) KMT2AMEN1ALDH1A1KDM4EATM
Bromide SCHEMBL5260393 0.82 KMT2A (0.81) KMT2AMEN1ALDH1A1KDM4EATM
Bromide SCHEMBL5260112 0.82 KMT2A (1.00) KMT2AMEN1ALDH1A1KDM4EATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240288772-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-08-29 US disclosed
CN-118284274-A Charge-transporting varnish 日产化学株式会社 2024-07-02 CN disclosed
US-20240160105-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-05-16 US disclosed
EP-4361192-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-05-01 EP disclosed
CN-117586478-A Curable composition, cured product thereof, and wafer level lens 株式会社大赛璐 2024-02-23 CN disclosed
US-20240059831-A1 CURABLE COMPOSITION AND CURED PRODUCT OF THE SAME, AND WAFER-LEVEL LENS DAICEL CORPORATION (JP) 2024-02-22 US disclosed
CN-117546089-A Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and pattern forming method 信越化学工业株式会社 2024-02-09 CN disclosed
CN-111406233-B Photosensitive resin composition, dry film resist and cured product thereof 日本化药株式会社 2023-12-26 CN disclosed
EP-4282895-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-29 EP disclosed
CN-116710846-A Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern forming method 信越化学工业株式会社 2023-09-05 CN disclosed
US-20160020395-A1 TREATMENT LIQUID CONTAINING IONIC COMPOUND, ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR PRODUCING ORGANIC ELECTRONIC ELEMENT RESONAC CORPORATION (JP) 2016-01-21 US disclosed
EP-2966942-A1 IONIC-COMPOUND-CONTAINING TREATMENT SOLUTION, ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR MANUFACTURING ORGANIC ELECTRONIC ELEMENT Hitachi Chemical Co., Ltd. (JP) 2016-01-13 EP disclosed
EP-2562839-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE Hitachi Chemical Company, Ltd. (JP) 2013-02-27 EP disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE HITACHI CHEMICAL COMPANY, LTD (JP) 2013-02-14 US disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
EP-2485290-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE Hitachi Chemical Company, Ltd. (JP) 2012-08-08 EP disclosed
US-20120181530-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE RESONAC CORPORATION (JP) 2012-07-19 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE L1CAM, CD99, EPB41L2 KMT2A 2098/4885MEN1 1526/4885ALDH1A1 1322/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST KMT2A 1227/4885MEN1 2080/4885ALDH1A1 1574/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.