Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11902989 | 0.98 | KDM4E (0.39) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| SCHEMBL1827433 | 0.93 | KDM4E (0.39) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| Dimethylamine SCHEMBL18008328 | 0.91 | KDM4E (0.35) | KDM4ETSHRTDP1 | |
| SCHEMBL1826686 | 0.91 | TSHR (0.38) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| SCHEMBL1824726 | 0.91 | TSHR (0.38) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| SCHEMBL383637 | 0.91 | TSHR (0.38) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| SCHEMBL1827215 | 0.91 | TSHR (0.38) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| SCHEMBL5484308 | 0.91 | TSHR (0.38) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| SCHEMBL1829776 | 0.91 | TSHR (0.38) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 | |
| SCHEMBL5485456 | 0.91 | TSHR (0.38) | KDM4ETSHRTDP1ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0012892-B1 | PROCESS FOR PREPARING POLYORGANOSILOXANES CONTAINING SILICIUM-LINKED FUNCTIONAL GROUPS | BAYER AG (DE) | 1982-06-02 | — | — | EP | claimed |
| US-4260715-A | ACYLOXY-SUBSTITUTED, SALT OF FLUORINATED ALKANESULFONIC ACID AS EQUILIBRATION CATALYST | BAYER AKTIENGESELLSCHAFT (DE) | 1981-04-07 | — | — | US | claimed |
| EP-0012892-A1 | Process for preparing polyorganosiloxanes containing silicium-linked functional groups | BAYER AG (DE) | 1980-07-09 | — | — | EP | claimed |
| US-20250236545-A1 | CATALYST-ENHANCED SUBCRITICAL HYDROTHERMAL DESTRUCTION OF PER- AND POLYFLUOROALKYL SUBSTANCES (PFAS) | COLORADO SCHOOL OF MINES (US) | 2025-07-24 | — | — | US | disclosed |
| US-20240291009-A1 | METHOD FOR PURIFYING TREATMENT TARGET SOLUTION | AGC Inc. (JP) | 2024-08-29 | — | — | US | disclosed |
| EP-4417582-A1 | METHOD FOR PURIFYING TREATMENT TARGET SOLUTION | AGC Inc. (JP) | 2024-08-21 | — | — | EP | disclosed |
| CN-118176168-A | Method for purifying liquid to be treated | ＡＧＣ株式会社 | 2024-06-11 | — | — | CN | disclosed |
| WO-2023063339-A1 | METHOD FOR PURIFYING TREATMENT TARGET SOLUTION | ＡＧＣ株式会社 | 2023-04-20 | — | — | WO | disclosed |
| CN-113252759-A | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2021-08-13 | — | — | CN | disclosed |
| US-20200326299-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2020-10-15 | — | — | US | disclosed |
| US-10732144-B2 | Electrochemical gas sensor and electrolyte for an electrochemical gas sensor | Dräger Safety AG & Co. KGaA (DE) | 2020-08-04 | — | — | US | disclosed |
| EP-3259583-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2017-12-27 | — | — | EP | disclosed |
| CN-103869623-B | Coating composition | 默克专利有限公司 | 2017-07-21 | — | — | CN | disclosed |
| WO-2016131549-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2016-08-25 | — | — | WO | disclosed |
| WO-2012105586-A1 | PERFLUOROBUTANE SULFONYL FLUORIDE, POTASSIUM PERFLUOROBUTANE SULFONATE SALT, AND METHOD FOR PRODUCING PERFLUOROBUTANE SULFONYL FLUORIDE | 三菱マテリアル株式会社 (JP) | 2012-08-09 | — | — | WO | disclosed |
| US-8021822-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-20 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20090186296-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-4260715-A | ACYLOXY-SUBSTITUTED, SALT OF FLUORINATED ALKANESULFONIC ACID AS EQUILIBRATION CATALYST | BAYER AKTIENGESELLSCHAFT (DE) | 1981-04-07 | — | — | US | disclosed |