Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | MMP1 | P03956 | 2/20 | 0.32 |
| ▸ | MMP2 | P08253 | 2/20 | 0.32 |
| ▸ | MMP9 | P14780 | 2/20 | 0.32 |
| ▸ | MMP8 | P22894 | 2/20 | 0.32 |
| ▸ | MMP13 | P45452 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5492476 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL1824726 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL1827215 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL5484308 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL1826316 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL1829776 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL1826686 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL5485456 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL383637 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 | |
| SCHEMBL1576526 | 0.98 | TSHR (0.38) | KDM4ETSHRTDP1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113252759-A | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2021-08-13 | — | — | CN | disclosed |
| US-20200326299-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2020-10-15 | — | — | US | disclosed |
| US-10732144-B2 | Electrochemical gas sensor and electrolyte for an electrochemical gas sensor | Dräger Safety AG & Co. KGaA (DE) | 2020-08-04 | — | — | US | disclosed |
| EP-3367088-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-08-29 | — | — | EP | disclosed |
| EP-1686425-B1 | METHOD FOR FORMING MULTILAYER RESIST | DAIKIN IND LTD (JP) | 2018-06-13 | — | — | EP | disclosed |
| US-20180031516-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-02-01 | — | — | US | disclosed |
| EP-3259583-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2017-12-27 | — | — | EP | disclosed |
| WO-2016131549-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2016-08-25 | — | — | WO | disclosed |
| CN-101080674-B | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP | 2013-09-18 | — | — | CN | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| CN-101080674-A | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP (JP) | 2007-11-28 | — | — | CN | disclosed |
| US-20070196763-A1 | Method of forming laminated resist | DAIKIN INDUSTRIES, LTD. | 2007-08-23 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| CN-1882882-A | Method for forming multilayer resist | DAIKIN IND LTD (JP) | 2006-12-20 | — | — | CN | disclosed |
| EP-1686425-A1 | METHOD FOR FORMING MULTILAYER RESIST | Daikin Industries, Ltd. (JP) | 2006-08-02 | — | — | EP | disclosed |