Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 13/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6716885 | 0.94 | SMN1; SMN2 (0.42) | KCNH2SMN1; SMN2KDM4EGAA | |
| SCHEMBL20060550 | 0.94 | SMN1; SMN2 (0.42) | KCNH2SMN1; SMN2KDM4EGAA | |
| Tetrabuthylammonium SCHEMBL1130800 | 0.90 | KCNH2 (0.50) | KCNH2SMN1; SMN2KDM4EGAA | |
| SCHEMBL8757415 | 0.87 | SMN1; SMN2 (0.40) | KCNH2SMN1; SMN2KDM4EGAA | |
| Biphenyl SCHEMBL7784630 | 0.85 | CYP1A2 (0.44) | KCNH2SMN1; SMN2KDM4EGAA | |
| SCHEMBL1130325 | 0.84 | DNM1 (0.47) | KCNH2SMN1; SMN2KDM4E | |
| Tetramethylammonium Ion SCHEMBL8567894 | 0.84 | HTT (0.40) | KCNH2SMN1; SMN2GRM2 | |
| Tetramethylammonium Ion SCHEMBL8567365 | 0.84 | HTT (0.40) | KCNH2SMN1; SMN2GRM2 | |
| Tetramethylammonium Ion SCHEMBL3615088 | 0.81 | DNM1 (0.44) | KCNH2SMN1; SMN2 | |
| Tetramethylammonium Ion SCHEMBL8574603 | 0.81 | DNM1 (0.44) | KCNH2SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113946103-B | Dry film resist, method for manufacturing circuit wiring, input device, and display device | 富士胶片株式会社 | 2024-05-07 | — | — | CN | disclosed |
| WO-2023032746-A1 | COMPOSITION, CURED FILM, STRUCTURE, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| US-11450445-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2022-09-20 | — | — | US | disclosed |
| US-20220082941-A1 | LAMINATE, COMPOSITION, AND, LAMINATE FORMING KIT | FUJIFILM CORPORATION (JP) | 2022-03-17 | — | — | US | disclosed |
| US-20200303086-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-09-24 | — | — | US | disclosed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-10289001-B2 | Pattern forming method, etching method and method for producing capacitance-type input device | FUJIFILM CORPORATION (JP) | 2019-05-14 | — | — | US | disclosed |
| US-20190011833-A1 | PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD | FUJIFILM CORPORATION (JP) | 2019-01-10 | — | — | US | disclosed |
| US-10108091-B2 | Photosensitive transfer material, pattern formation method, and etching method | FUJIFILM CORPORATION (JP) | 2018-10-23 | — | — | US | disclosed |
| US-9810984-B2 | Photosensitive transfer material, pattern formation method, and etching method | FUJIFILM CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| US-20030187119-A1 | Radiation-sensitive composition capable of having refractive index distribution | JSR CORPORATION (JP) | 2003-10-02 | — | — | US | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1331518-A2 | Radiation sensitive composition for forming an insulating film, insulating film and display device | JSR Corporation (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |