Biphenyl

Biphenyl

SCHEMBL7784630

CCCCCC[B-](c1ccc(Cl)cc1)(c1ccc(Cl)cc1)c1ccc(Cl)cc1.[IH2+].c1ccc(-c2ccccc2)cc1

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.44
MGLL Q99685 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
KCNH2 Q12809 3/20 0.36
NR5A2 O00482 1/20 0.35
NR5A1 Q13285 1/20 0.35
KDM4E B2RXH2 1/20 0.35
GAA P10253 1/20 0.35
MMP2 P08253 1/20 0.35
MMP9 P14780 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20060550 0.90 SMN1; SMN2 (0.42) SMN1; SMN2KCNH2KDM4EGAA
SCHEMBL6716885 0.90 SMN1; SMN2 (0.42) SMN1; SMN2KCNH2KDM4EGAA
SCHEMBL20060467 0.88 MGLL (0.43) CYP1A2MGLLSMN1; SMN2KDM4EGAA
SCHEMBL1130143 0.86 KCNH2 (0.33) CYP1A2SMN1; SMN2KCNH2NR5A2NR5A1
SCHEMBL1131201 0.86 SMN1; SMN2 (0.36) CYP1A2SMN1; SMN2KCNH2NR5A2NR5A1
Tetramethylammonium Ion SCHEMBL1130159 0.85 KCNH2 (0.41) SMN1; SMN2KCNH2KDM4EGAA
SCHEMBL1130325 0.83 DNM1 (0.47) SMN1; SMN2KCNH2KDM4E
SCHEMBL8757415 0.82 SMN1; SMN2 (0.40) SMN1; SMN2KCNH2KDM4EGAAMMP2
SCHEMBL810136 0.82 DNM1 (0.40) SMN1; SMN2KCNH2
SCHEMBL308412 0.82 DNM1 (0.40) SMN1; SMN2KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed