SCHEMBL1130461

SCHEMBL1130461

C(=C1/CCCC/C1=C\c1ccccc1)\c1ccccc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.68
F3 P13726 1/20 0.68
ALDH1A1 P00352 3/20 0.65
HTT P42858 2/20 0.65
HPGD P15428 3/20 0.64
LMNA P02545 3/20 0.64
GAA P10253 4/20 0.55
MGAM O43451 3/20 0.55
SI P14410 3/20 0.55
MGAM2 Q2M2H8 3/20 0.55
MAPT P10636 3/20 0.53
MIF P14174 2/20 0.53
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
EGFR P00533 1/20 0.47
MAOB P27338 2/20 0.47
SMN1; SMN2 Q16637 1/20 0.45
CYP19A1 P11511 1/20 0.44
CYP11B1 P15538 1/20 0.44
CYP11B2 P19099 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1130462 1.00 CYP1A2 (0.68) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL3263383 0.86 CYP1A2 (0.92) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL3263387 0.86 CYP1A2 (0.92) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL11789316 0.84 CYP1A2 (0.88) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL979654 0.84 ALDH1A1 (0.92) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL11635567 0.84 CYP1A2 (0.57) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL979655 0.84 ALDH1A1 (0.92) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL11789309 0.84 CYP1A2 (0.88) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL10734311 0.84 ALDH1A1 (0.92) CYP1A2F3ALDH1A1HTTHPGD
SCHEMBL13465476 0.84 CYP1A2 (0.57) CYP1A2F3ALDH1A1HTTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8057699-B2 Polymerizable liquid crystal composition and uses for the same JNC CORPORATION (JP) 2011-11-15 US disclosed
US-8048336-B2 Polymerizable cholesteric liquid crystal composition and its use CHISSO CORPORATION (JP) 2011-11-01 US disclosed
EP-1323742-B1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORP (JP) 2011-02-16 EP disclosed
EP-2012198-B1 METHOD AND EQUIPMENT FOR PROCESSING OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDER/REPRODUCER FUJIFILM CORP (JP) 2010-11-24 EP disclosed
US-20100272924-A1 POLYMERIZABLE CHOLESTERIC LIQUID CRYSTAL COMPOSITION AND ITS USE CHISSO CORPORATION (JP) 2010-10-28 US disclosed
US-20100219374-A1 Polymerizable Liquid Crystal Composition and Uses for the Same CHISSO CORPORATION (JP) 2010-09-02 US disclosed
US-7744776-B2 Polymerizable liquid crystal composition and uses for the same CHISSO CORPORATION (JP) 2010-06-29 US disclosed
US-20100061212-A1 METHOD AND DEVICE FOR OPTICAL RECORDING MEDIUM, AND OPTICAL RECORDING AND REPRODUCING APPARATUS FUJIFILM CORPORATION (JP) 2010-03-11 US disclosed
EP-2003520-A9 PHOTOSENSITIVE COMPOSITION, OPTICAL RECORDING MEDIUM AND METHOD FOR MANUFACTURING SAME, OPTICAL RECORDING METHOD, AND OPTICAL RECORDING APPARATUS FUJIFILM Corporation (JP) 2009-04-15 EP disclosed
US-20090081561-A1 PHOTOSENSITIVE COMPOSITION, OPTICAL RECORDING MEDIUM AND METHOD FOR MANUFACTURING SAME, OPTICAL RECORDING METHOD, AND OPTICAL RECORDING APPARATUS FUJIFILM CORPORATION (JP) 2009-03-26 US disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed
US-20020055059-A1 Radiation sensitive resin composition, cathode separator and el display device JSR CORPORATION (JP) 2002-05-09 US disclosed
EP-1193557-A1 Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device JSR Corporation (JP) 2002-04-03 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed
EP-0594452-B1 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO LTD (JP) 1997-01-15 EP disclosed
US-5432039-A Radiation sensitive quinone diazide and resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-07-11 US disclosed
EP-0594452-A2 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-04-27 EP disclosed