SCHEMBL1130592

SCHEMBL1130592

CC(CBr)CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11363254 1.00
SCHEMBL8564564 1.00
SCHEMBL1130118 0.82
SCHEMBL696503 0.80
SCHEMBL28762 0.79
SCHEMBL22269916 0.79 LMNA (0.30)
SCHEMBL11540243 0.79 TSHR (0.52)
SCHEMBL7049979 0.79
SCHEMBL4086725 0.78 LMNA (0.38)
SCHEMBL11503229 0.78 LMNA (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1323742-B1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORP (JP) 2011-02-16 EP disclosed
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
US-7108954-B2 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2006-09-19 US disclosed
EP-1494072-A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR Corporation (JP) 2005-01-05 EP disclosed
US-20040265737-A1 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR CORPORATION (JP) 2004-12-30 US disclosed
US-6828078-B2 Photoresist for use in optoelectronic and display fields; porosity; optical fibers JSR CORPORATION (JP) 2004-12-07 US disclosed
US-6787289-B2 OPTICS JSR CORPORATION (JP) 2004-09-07 US disclosed
US-20040013972-A1 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2004-01-22 US disclosed
EP-1350814-A1 RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX JSR Corporation (JP) 2003-10-08 EP disclosed
US-20030139486-A1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORPORATION (JP) 2003-07-24 US disclosed
US-20030064303-A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern JSR CORPORATION (JP) 2003-04-03 US disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed
US-5719141-A HYPOTENSIVE AGENTS NOVARTIS CORPORATION (US) 1998-02-17 US disclosed
US-5077046-A Plant extracts; mannaliam dolichols intermediates KURARAY CO., LTD. (JP) 1991-12-31 US disclosed
US-5012018-A Extending polyisoprene chain using copper catalyst KURARAY CO., LTD. (JP) 1991-04-30 US disclosed
US-4886904-A CONTAINING CIS AND TRANS ISOPRENE UNITS KURARAY CO., LTD. (JP) 1989-12-12 US disclosed
EP-0054753-B1 POLYPRENYL COMPOSITION OR COMPOUNDS AND PROCESS FOR THE PRODUCTION THEREOF KURARAY CO., LTD. (JP) 1985-07-24 EP disclosed
EP-0054753-A1 Polyprenyl composition or compounds and process for the production thereof KURARAY CO., LTD. (JP) 1982-06-30 EP disclosed
US-4305876-A CULTURE PRODUCT INTERMEDIATE IN THE PREPARATION OF VITAMINS E AND K HOFFMANN-LA ROCHE, INC. (US) 1981-12-15 US disclosed
US-4138289-A ASYMMETRIC HYDROGENATION BY MICROORGANISM, FERMENTATION HOFFMANN-LA ROCHE INC. (US) 1979-02-06 US disclosed