⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL633776 | 0.84 | — | — | |
| SCHEMBL28762 | 0.84 | — | — | |
| SCHEMBL28734508 | 0.83 | — | — | |
| SCHEMBL11059751 | 0.81 | ALDH1A1 (0.55) | — | |
| Ethylene Glycol SCHEMBL5930511 | 0.81 | ALDH1A1 (0.55) | — | |
| SCHEMBL1130592 | 0.79 | — | — | |
| SCHEMBL11363254 | 0.79 | — | — | |
| SCHEMBL20522695 | 0.79 | — | — | |
| SCHEMBL8564564 | 0.79 | — | — | |
| SCHEMBL17583756 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111954848-B | Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member | DIC株式会社 | 2024-05-03 | — | — | CN | disclosed |
| CN-111194301-B | Synthesis of aliphatic alcohols as fragrance chemicals | 巴斯夫欧洲公司 | 2023-12-19 | — | — | CN | disclosed |
| EP-3694829-B1 | SYNTHESIS OF ALIPHATIC ALCOHOLS AS AROMA CHEMICALS | BASF SE (DE) | 2023-12-13 | — | — | EP | disclosed |
| CN-109153653-B | Novel compound, photocurable composition, cured product thereof, printing ink, and printed matter using the printing ink | DIC株式会社 | 2022-06-28 | — | — | CN | disclosed |
| US-11286224-B2 | Synthesis of aliphatic alcohols as aroma chemicals | BASF SE (DE) | 2022-03-29 | — | — | US | disclosed |
| US-11079675-B2 | Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink | DIC CORPORATION (JP) | 2021-08-03 | — | — | US | disclosed |
| US-20210188748-A1 | SYNTHESIS OF ALIPHATIC ALCOHOLS AS AROMA CHEMICALS | BASF SE (DE) | 2021-06-24 | — | — | US | disclosed |
| CN-111954848-A | Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member | DIC株式会社 | 2020-11-17 | — | — | CN | disclosed |
| EP-3694829-A1 | SYNTHESIS OF ALIPHATIC ALCOHOLS AS AROMA CHEMICALS | BASF SE (DE) | 2020-08-19 | — | — | EP | disclosed |
| CN-111194301-A | Synthesis of aliphatic alcohols as fragrance chemicals | 巴斯夫欧洲公司 | 2020-05-22 | — | — | CN | disclosed |
| WO-2019198490-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, INSULATING MATERIAL, RESIN MATERIAL FOR SOLDER RESISTS AND RESIST MEMBER | DIC株式会社 | 2019-10-17 | — | — | WO | disclosed |
| US-20190137872-A1 | NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK | DIC CORPORATION (JP) | 2019-05-09 | — | — | US | disclosed |
| WO-2019072669-A1 | SYNTHESIS OF ALIPHATIC ALCOHOLS AS AROMA CHEMICALS | BASF SE (DE) | 2019-04-18 | — | — | WO | disclosed |
| EP-3470388-A1 | SYNTHESIS OF ALIPHATIC ALCOHOLS AS AROMA CHEMICALS | BASF SE (DE) | 2019-04-17 | — | — | EP | disclosed |
| WO-2011082487-A1 | BISPHENOL DERIVATIVES AND THEIR USE AS ANDROGEN RECEPTOR ACTIVITY MODULATORS | BRITISH COLUMBIA CANCER AGENCY BRANCH (CA) | 2011-07-14 | — | — | WO | disclosed |
| EP-1029841-B1 | 6-Substituted 3-methyloct-6-enols | GIVAUDAN SA (CH) | 2003-04-09 | — | — | EP | disclosed |
| US-6297211-B1 | PERFUMES AND BRANCHED UNSATURATED ALCOHOLS | GIVAUDAN ROURE (INTERNATIONAL) SA (CH) | 2001-10-02 | — | — | US | disclosed |
| EP-1029841-A1 | 6-Substituted 3-methyloct-6-enols | Givaudan Roure (International) S.A. (CH) | 2000-08-23 | — | — | EP | disclosed |