Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.55 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.51 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.50 |
| ▸ | CDC25B | P30305 | 1/20 | 0.50 |
| ▸ | S100A4 | P26447 | 2/20 | 0.48 |
| ▸ | BCL2 | P10415 | 1/20 | 0.48 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.48 |
| ▸ | IDO1 | P14902 | 1/20 | 0.48 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.48 |
| ▸ | DNMT3L | Q9UJW3 | 1/20 | 0.48 |
| ▸ | DNMT3A | Q9Y6K1 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 6/20 | 0.46 |
| ▸ | RAB9A | P51151 | 6/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29587496 | 1.00 | ELANE (0.55) | ELANECYP1A1CYP1A2MEN1KMT2A | |
| SCHEMBL2125571 | 0.84 | MEN1 (0.63) | ELANECYP1A2MEN1KMT2ACDC25B | |
| SCHEMBL29651770 | 0.84 | MEN1 (0.63) | ELANECYP1A2MEN1KMT2ACDC25B | |
| SCHEMBL56435 | 0.84 | ELANE (0.67) | ELANEMEN1KMT2ACDC25BS100A4 | |
| SCHEMBL9269288 | 0.80 | ELANE (0.61) | ELANECYP1A2MEN1KMT2ACDC25B | |
| SCHEMBL14884476 | 0.80 | NQO1 (0.42) | ELANECYP1A1CYP1A2MEN1KMT2A | |
| SCHEMBL24297720 | 0.79 | S100A4 (0.61) | ELANES100A4SMN1; SMN2TP53CES1 | |
| SCHEMBL21498278 | 0.78 | CYP1A1 (0.55) | ELANECYP1A1CYP1A2MEN1KMT2A | |
| SCHEMBL13210193 | 0.77 | CYP1A1 (0.43) | ELANECYP1A1CYP1A2MEN1KMT2A | |
| SCHEMBL9175638 | 0.75 | ELANE (0.55) | ELANEMEN1KMT2ACDC25BS100A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 916 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119842269-A | Black pigment liquid and preparation method thereof, photoresist composition, photosensitive glass and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-18 | — | — | CN | claimed |
| CN-119799077-A | Pigment dispersion liquid, photoresist composition, photosensitive glass and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |
| US-4145356-A | CRYSTALLIZATION IN SOLVENT CONTAINING AN ANTHRAQUINONE COMPOUND | BASF AKTIENGESELLSCHAFT (DE) | 1979-03-20 | — | — | US | claimed |
| CN-122095314-A | Photosensitive resin laminate, method for forming resist pattern, and method for manufacturing wiring board having conductor pattern | — | 2026-05-26 | — | — | CN | disclosed |
| CN-117916082-B | Laminate and method for producing laminate | 富士胶片株式会社 | 2026-05-15 | — | — | CN | disclosed |
| WO-2026100708-A1 | PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-114114841-B | Photosensitive resin laminate and method for forming resist pattern | 旭化成株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-20250277122-A1 | Photopolymerizable HOE Composition | XETOS AG (DE) | 2025-09-04 | — | — | US | disclosed |
| US-12345850-B2 | Laminate and method for manufacturing laminate | FUJIFILM CORPORATION (JP) | 2025-07-01 | — | — | US | disclosed |
| CN-120137119-A | Pigment dispersant, pigment dispersion liquid and photoresist composition | 阜阳欣奕华新材料科技股份有限公司 | 2025-06-13 | — | — | CN | disclosed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| US-4035321-A | Preparation of ultraviolet curable acrylated polymers | CELANESE CORPORATION (US) | 1977-07-12 | — | — | US | disclosed |
| US-4019909-A | BLOWING AGENT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-04-26 | — | — | US | disclosed |
| US-4016334-A | Method of applying high adhesion ultraviolet curable coatings and coated articles | CELANESE CORPORATION (US) | 1977-04-05 | — | — | US | disclosed |
| US-4003877-A | Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions | DYNACHEM CORPORATION (US) | 1977-01-18 | — | — | US | disclosed |
| US-3992276-A | Unsaturated polyesters for ultraviolet curable coatings | CELANESE CORPORATION (US) | 1976-11-16 | — | — | US | disclosed |
| US-3984244-A | Process for laminating a channeled photosensitive layer on an irregular surface | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-10-05 | — | — | US | disclosed |
| US-3953214-A | HYDROXYALKYL ACRYLATE OR METHACRYLATE, POLYESTER BINDER, FREE RADICAL INITIATOR | DYNACHEM CORPORATION (US) | 1976-04-27 | — | — | US | disclosed |
| US-3953309-A | PHOTORESISTS | DYNACHEM CORPORATION (US) | 1976-04-27 | — | — | US | disclosed |