Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPBAR1 | Q8TDU6 | 4/20 | 0.58 |
| ▸ | VDR | P11473 | 4/20 | 0.58 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.58 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.58 |
| ▸ | EPHA2 | P29317 | 4/20 | 0.54 |
| ▸ | CASP7 | P55210 | 3/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.54 |
| ▸ | USP2 | O75604 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | TP53 | P04637 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | BLM | P54132 | 2/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.54 |
| ▸ | MDM4 | O15151 | 1/20 | 0.54 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.54 |
| ▸ | TSHR | P16473 | 1/20 | 0.54 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.54 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1133762 | 1.00 | GPBAR1 (0.58) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL8568004 | 0.91 | GPBAR1 (0.61) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL8568002 | 0.91 | GPBAR1 (0.61) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL8102663 | 0.88 | GPBAR1 (0.56) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL13655500 | 0.84 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL22871996 | 0.84 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL4759767 | 0.84 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL22871867 | 0.84 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL18575950 | 0.84 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL8736943 | 0.84 | GPBAR1 (0.80) | GPBAR1VDRHIF1ACYP2C9EPHA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5580694-A | ACRYLIC ACID, ACRYLIC ESTER COPOLYMER, RADIATION SENSITIVE ACID GENERATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-12-03 | — | — | US | claimed |
| EP-0690348-A2 | Photoresist composition for deep ultraviolet radiation and process for its use | International Business Machines Corporation (US) | 1996-01-03 | — | — | EP | claimed |
| US-9851639-B2 | Photoacid generating polymers containing a urethane linkage for lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-12-26 | — | — | US | disclosed |
| US-9422445-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-08-23 | — | — | US | disclosed |
| US-20160053129-A1 | Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use | CENTRAL GLASS CO., LTD. (JP) | 2016-02-25 | — | — | US | disclosed |
| US-9223217-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-12-29 | — | — | US | disclosed |
| US-9223209-B2 | Sulfonamide-containing photoresist compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-12-29 | — | — | US | disclosed |
| US-8945808-B2 | Self-topcoating resist for photolithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-02-03 | — | — | US | disclosed |
| US-20130260313-A1 | PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY | CENTRAL GLASS CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-2285845-B1 | LOW OUTGASSING PHOTORESIST COMPOSITIONS | IBM (US) | 2013-09-04 | — | — | EP | disclosed |
| US-8323868-B2 | Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-04 | — | — | US | disclosed |
| US-20020146638-A1 | Norbornene fluoroacrylate copolymers and process for use thereof | GLOBALFOUNDRIES U.S. INC. | 2002-10-10 | — | — | US | disclosed |
| US-20020102490-A1 | Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions | GLOBALFOUNDRIES U.S. INC. | 2002-08-01 | — | — | US | disclosed |
| US-20020090572-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES U.S. INC. | 2002-07-11 | — | — | US | disclosed |
| US-20020081520-A1 | Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications | GLOBALFOUNDRIES INC. (KY) | 2002-06-27 | — | — | US | disclosed |
| US-6365321-B1 | COPOLYMER WITH ACRYLATE HAVING ACID LABILE GROUP, HOMOGENOUSLY BLENDED WITH PHENOLIC POLYMER WHICH IS PARTIALLY OR WHOLLY PROTECTED | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-04-02 | — | — | US | disclosed |
| US-6093517-A | CONSISTS OF A RADIATION SENSITIVE ACID GENERATOR, A POLYMERIC BINDER AND A DISSOLUTION INHIBITOR CONSISTS OF A CALIX(4)RESORCINARENE PARTIALLY OR WHOLLY PROTECTED WITH ACID-LABILE PROTECTING GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-07-25 | — | — | US | disclosed |
| US-5786131-A | COATING SUBSTRATE WITH FILM COMPRISING RADIATION SENSITIVE ACID GENERATOR, ANDROSTANE-17-ALKYLCARBOXYLATE, AND ACRYLIC POLYMER, EXPOSING, DEVELOPING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1998-07-28 | — | — | US | disclosed |
| US-5580694-A | ACRYLIC ACID, ACRYLIC ESTER COPOLYMER, RADIATION SENSITIVE ACID GENERATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-12-03 | — | — | US | disclosed |
| EP-0690348-A2 | Photoresist composition for deep ultraviolet radiation and process for its use | International Business Machines Corporation (US) | 1996-01-03 | — | — | EP | disclosed |