SCHEMBL1144232

SCHEMBL1144232

C[SiH](C)CC1CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14986733 0.77
SCHEMBL9308721 0.71
SCHEMBL12852147 0.71
SCHEMBL9395231 0.69 KMT2A (0.33)
SCHEMBL3741955 0.69
SCHEMBL3748159 0.66 SMN1; SMN2 (0.34)
SCHEMBL10016119 0.66
SCHEMBL18406275 0.66 ALDH1A1 (0.54)
SCHEMBL10529072 0.65
SCHEMBL8601512 0.65 TSHR (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108610504-A A kind of preparation method with hierarchical porous structure integral material 中国科学院大连化学物理研究所 2018-10-02 CN claimed
JP-62297840-A None JP disclosed
CN-113966350-B Modified vinyl aromatic copolymer, process for producing the same, modified conjugated diene copolymer, and use of the same 日铁化学材料株式会社 2025-03-18 CN disclosed
US-12173098-B2 Modified vinylaromatic copolymer, production method therefor, modified conjugated diene copolymer obtained therefrom and composition thereof, crosslinked rubber object, and tire member NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) 2024-12-24 US disclosed
EP-4442713-A1 MODIFIED VINYL AROMATIC COPOLYMER, METHOD FOR PRODUCING SAME, MODIFIED CONJUGATED DIENE COPOLYMER OBTAINED FROM SAME, RESIN COMPOSITION, CROSSLINKED RESIN AND STRUCTURAL MEMBER NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) 2024-10-09 EP disclosed
CN-118355038-A Modified vinyl aromatic copolymer, method for producing same, modified conjugated diene copolymer obtained from same, resin composition, resin crosslinked product, and structural member 日铁化学材料株式会社 2024-07-16 CN disclosed
US-20230102867-A1 MODIFIED VINYLAROMATIC COPOLYMER, PRODUCTION METHOD THEREFOR, MODIFIED CONJUGATED DIENE COPOLYMER OBTAINED THEREFROM AND COMPOSITION THEREOF, CROSSLINKED RUBBER OBJECT, AND TIRE MEMBER NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) 2023-03-30 US disclosed
CN-112142883-B Continuous hydrogenation method and device for conjugated diene polymer 沈阳化工研究院有限公司 2022-06-07 CN disclosed
EP-4005819-A1 MODIFIED VINYLAROMATIC COPOLYMER, PRODUCTION METHOD THEREFOR, MODIFIED CONJUGATED-DIENE COPOLYMER OBTAINED THEREFROM AND COMPOSITION THEREOF, CROSSLINKED RUBBER OBJECT, AND TIRE MEMBER Nippon Steel Chemical & Material Co., Ltd. (JP) 2022-06-01 EP disclosed
CN-113966350-A Modified vinyl aromatic copolymer and method for producing same, modified conjugated diene copolymer obtained therefrom, composition of modified conjugated diene copolymer, crosslinked rubber, and tire member 日铁化学材料株式会社 2022-01-21 CN disclosed
US-20120010337-A1 Method For Treating A Carbon Allotrope XEROX CORPORATION (US) 2012-01-12 US disclosed
US-8084177-B2 Toners containing polyhedral oligomeric silsesquioxanes XEROX CORPORATION (US) 2011-12-27 US disclosed
US-7985523-B2 Toners containing polyhedral oligomeric silsesquioxanes XEROX CORPORATION (US) 2011-07-26 US disclosed
EP-2289974-A2 Polyhedral oligomeric silsesquioxane image conditioning coating Xerox Corporation (US) 2011-03-02 EP disclosed
US-20110045186-A1 Polyhedral Oligomeric Silsesquioxane Image Conditioning Coating XEROX CORPORATION (US) 2011-02-24 US disclosed
US-20100159375-A1 TONERS CONTAINING POLYHEDRAL OLIGOMERIC SILSESQUIOXANES XEROX CORPORATION (US) 2010-06-24 US disclosed
US-20100159376-A1 TONERS CONTAINING POLYHEDRAL OLIGOMERIC SILSESQUIOXANES XEROX CORPORATION (US) 2010-06-24 US disclosed
US-7232864-B2 Coupled radial anionic polymers KRATON CHEMICAL, LLC 2007-06-19 US disclosed
US-20050107541-A1 Coupled radial anionic polymers KRATON CHEMICAL, LLC 2005-05-19 US disclosed
JP-S62297840-A NEGATIVE TYPE ELECTRON RAY RESIST MATERIAL AND FORMATION OF RESIST PATTERN OKI ELECTRIC IND CO LTD 1987-12-25 JP disclosed