Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3741254 | 0.82 | SMN1; SMN2 (0.41) | SMN1; SMN2ALDH1A1TDP1TSHR | |
| SCHEMBL3744130 | 0.82 | EPHX1 (0.38) | — | |
| SCHEMBL27405339 | 0.81 | SMN1; SMN2 (0.34) | SMN1; SMN2ALDH1A1TDP1TSHRMAPK1 | |
| SCHEMBL3743263 | 0.77 | ALDH1A1 (0.40) | SMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL3741955 | 0.75 | — | — | |
| SCHEMBL27996683 | 0.74 | — | — | |
| SCHEMBL1868366 | 0.74 | SMN1; SMN2 (0.47) | SMN1; SMN2ALDH1A1TDP1TSHRMAPK1 | |
| SCHEMBL17531044 | 0.74 | ALDH1A1 (0.47) | SMN1; SMN2ALDH1A1TDP1TSHR | |
| SCHEMBL1096865 | 0.73 | ALDH1A1 (0.50) | SMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL1564891 | 0.73 | SMN1; SMN2 (0.41) | SMN1; SMN2ALDH1A1TDP1TSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117940849-A | Wafer edge protection film forming composition for semiconductor manufacturing | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117716295-A | Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-117396810-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117255971-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117083570-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| US-7834120-B2 | Monofunctional monomer having cage oligosiloxane structure and method of making | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| EP-1645560-B1 | Monofunctional monomer having cage oligosiloxane structure and method of making | SHINETSU CHEMICAL CO (JP) | 2008-05-28 | — | — | EP | disclosed |
| EP-1645560-A1 | Monofunctional monomer having cage oligosiloxane structure and method of making | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-04-12 | — | — | EP | disclosed |
| US-20060074213-A1 | Monofunctional monomer having cage oligosiloxane structure and method of making | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-04-06 | — | — | US | disclosed |