SCHEMBL1150849

SCHEMBL1150849

Cc1cc(C)c(C(=O)C(O)c2ccccc2)c(C)c1.O=[P](c1ccccc1)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.44
CES2 O00748 1/20 0.44
CES1 P23141 1/20 0.44
MAPK1 P28482 1/20 0.40
ALDH1A1 P00352 3/20 0.39
KDM4E B2RXH2 1/20 0.39
HPGD P15428 1/20 0.37
SLC6A2 P23975 2/20 0.37
SLC6A4 P31645 2/20 0.37
SLC6A3 Q01959 2/20 0.37
KEAP1 Q14145 1/20 0.35
NFE2L2 Q16236 1/20 0.35
NPSR1 Q6W5P4 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
GAA P10253 1/20 0.34
HTT P42858 1/20 0.34
TP53 P04637 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5999762 0.89 LMNA (0.53) LMNACES2CES1MAPK1ALDH1A1
SCHEMBL29130636 0.88 LMNA (0.52) LMNACES2CES1MAPK1ALDH1A1
SCHEMBL4067604 0.81 LMNA (0.45) LMNACES2CES1MAPK1ALDH1A1
SCHEMBL14659767 0.80 LMNA (0.44) LMNACES2CES1MAPK1ALDH1A1
SCHEMBL2035885 0.80 LMNA (0.44) LMNACES2CES1MAPK1ALDH1A1
SCHEMBL954446 0.80 LMNA (0.44) LMNACES2CES1MAPK1ALDH1A1
SCHEMBL2035884 0.80 LMNA (0.44) LMNACES2CES1MAPK1ALDH1A1
SCHEMBL23094065 0.78 KMT2A (0.42) LMNACES2CES1MAPK1L3MBTL1
SCHEMBL28520511 0.77 KMT2A (0.38) LMNAALDH1A1KDM4EHPGDNPSR1
SCHEMBL28390323 0.75 LMNA (0.45) LMNACES2CES1MAPK1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024134920-A1 INKJET INK COMPOSITION, RECORDED ARTICLE, INKJET RECORDING METHOD, AND INKJET RECORDING SYSTEM コニカミノルタ株式会社 2024-06-27 WO disclosed
US-11926746-B2 Active energy ray-curable ink and image recording method FUJIFILM CORPORATION (JP) 2024-03-12 US disclosed
EP-3995547-B1 THERMALLY CURABLE INK-JET INK KONICA MINOLTA INC (JP) 2024-02-07 EP disclosed
WO-2024004861-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION, AND CURED PRODUCT THEREOF DIC株式会社 2024-01-04 WO disclosed
WO-2023233894-A1 ACTINIC RADIATION-CURABLE INKJET RESIST INK, METHOD FOR FORMING CURED FILM, CURED FILM, PRINTED WIRING BOARD, AND ELECTRONIC DEVICE コニカミノルタ株式会社 2023-12-07 WO disclosed
WO-2023228803-A1 ACTIVE RAY-CURABLE COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, AND CURED FILM PRODUCTION DEVICE コニカミノルタ株式会社 2023-11-30 WO disclosed
WO-2023182361-A1 LIQUID CRYSTAL SEALING AGENT, METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY PANEL, AND LIQUID CRYSTAL DISPLAY PANEL 三井化学株式会社 2023-09-28 WO disclosed
WO-2023127016-A1 CURABLE INK COMPOSITION, CURED FILM, RECORDING METHOD, RECORDING DEVICE, AND PRINTED WIRING BOARD コニカミノルタ株式会社 2023-07-06 WO disclosed
WO-2023079620-A1 INKJET INK FOR FORMING PARTITION, INKJET INK SET FOR FORMING PARTITION, METHOD FOR MANUFACTURING LED DEVICE, AND LED DEVICE コニカミノルタ株式会社 2023-05-11 WO disclosed
WO-2023079622-A1 INKJET INK FOR PARTITION WALL FORMATION, INKJET INK SET FOR PARTITION WALL FORMATION, AND LED DEVICE MANUFACTURING METHOD コニカミノルタ株式会社 2023-05-11 WO disclosed
EP-1302514-A2 Active energy ray-curable antistatic coating composition MITSUBISHI CHEMICAL CORPORATION (JP) 2003-04-16 EP disclosed
EP-0878482-B1 An active energy ray curable composition comprised of a maleimide derivative and a method for curing the said curable composition DAINIPPON INK & CHEMICALS (JP) 2003-03-26 EP disclosed
US-6410611-B1 COATINGS, SURFACE FINISHES, BINDERS DAINIPPON INK AND CHEMICALS, INC. (JP) 2002-06-25 US disclosed
EP-0869155-B1 Activation energy beam curable coating composition MITSUBISHI CHEM CORP (JP) 2001-10-24 EP disclosed
US-6033743-A Antireflection film containing ultrafine particles, polarizing plate and liquid crystal display device DAI NIPPON PRINTING CO., LTD. (JP) 2000-03-07 US disclosed
US-6017974-A A QUATERNIZED, ACRYLATED POLYSILOXANE FORMING A CURED FILM EXCELLENT IN ABRASION RESISTANCE, ANTISTATIC PROPERTIES AND TRANSPARENCY MITSUBISHI CHEMICAL CORPORATION (JP) 2000-01-25 US disclosed
EP-0878482-A1 An active energy ray curable composition comprised of a maleimide derivative and a method for curing the said curable composition DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-11-18 EP disclosed
EP-0869155-A1 Activation energy beam curable coating composition MITSUBISHI CHEMICAL CORPORATION (JP) 1998-10-07 EP disclosed
US-5780526-A OIL-MODIFIED ALKYD RESIN, SENSITIZER CONTAINING METHACRYLOYL GROUPS NIPPON PAINT CO., LTD. (JP) 1998-07-14 US disclosed
US-5770306-A FORMED OF RESIN COMPOSITION HAVING EXCELLENT DISPERSIBILITY OF PARTICLES IN A BINDER RESIN DAI NIPPON PRINTING CO., LTD. (JP) 1998-06-23 US disclosed