Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9637174 | 0.81 | MEN1 (0.34) | MEN1KMT2APTPN1SLC6A3 | |
| SCHEMBL13036018 | 0.78 | MEN1 (0.31) | MEN1KMT2A | |
| SCHEMBL1151308 | 0.77 | MEN1 (0.34) | MEN1KMT2ASLC6A3ALDH1A1 | |
| SCHEMBL7975079 | 0.76 | MEN1 (0.35) | MEN1KMT2APTPN1ALDH1A1 | |
| SCHEMBL19105297 | 0.76 | NAAA (0.40) | ALDH1A1NPSR1 | |
| SCHEMBL7976308 | 0.74 | MEN1 (0.34) | MEN1KMT2APTPN1ALDH1A1 | |
| SCHEMBL14640917 | 0.74 | SLC6A3 (0.37) | MEN1KMT2ASLC6A3NPSR1 | |
| SCHEMBL11931641 | 0.74 | SLC6A3 (0.37) | MEN1KMT2ASLC6A3NPSR1 | |
| SCHEMBL10799911 | 0.74 | SLC6A3 (0.37) | MEN1KMT2ASLC6A3NPSR1 | |
| SCHEMBL24082950 | 0.74 | MEN1 (0.35) | MEN1KMT2APTPN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8334088-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-20110045407-A1 | Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| US-7883828-B2 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-08 | — | — | US | disclosed |
| US-7824845-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-02 | — | — | US | disclosed |
| US-20090081598-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081597-A1 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081579-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081585-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |