Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1349276 | 0.98 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL2349829 | 0.82 | — | — | |
| SCHEMBL17948249 | 0.79 | MEN1 (0.30) | — | |
| SCHEMBL7201976 | 0.75 | HSD11B1 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL6758976 | 0.75 | — | — | |
| SCHEMBL5318549 | 0.73 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL12191694 | 0.72 | P2RX7 (0.41) | CYP2D6CYP2C19P2RX7 | |
| SCHEMBL5423530 | 0.72 | P2RX7 (0.41) | CYP2D6CYP2C19P2RX7 | |
| SCHEMBL7201981 | 0.72 | HSD11B1 (0.31) | CYP2D6CYP2C19 | |
| SCHEMBL32688678 | 0.72 | P2RX7 (0.41) | CYP2D6CYP2C19P2RX7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8334088-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-8247162-B2 | Methods of forming a pattern using photoresist compositions | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-08-21 | — | — | US | disclosed |
| US-20110045407-A1 | Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| US-7883828-B2 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-08 | — | — | US | disclosed |
| US-7824845-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-02 | — | — | US | disclosed |
| US-20100266966-A1 | Methods of forming a pattern using photoresist compositions | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-10-21 | — | — | US | disclosed |
| US-20090081598-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081597-A1 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081579-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081585-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |