Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APLNR | P35414 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.33 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3580179 | 0.73 | SLC1A2 (0.38) | APLNRSLC1A2SLC1A1HSD11B1 | |
| SCHEMBL25929681 | 0.69 | SLC1A2 (0.40) | APLNRSLC1A2SLC1A1HSD11B1 | |
| SCHEMBL9141620 | 0.67 | GRM4 (0.34) | SLC1A2SLC1A1HSD11B1 | |
| SCHEMBL22941787 | 0.67 | GRM4 (0.34) | SLC1A2SLC1A1 | |
| SCHEMBL5925394 | 0.66 | GRM2 (0.33) | SLC1A2SLC1A1 | |
| SCHEMBL1029829 | 0.66 | SLC6A12 (0.46) | SLC1A2SLC1A1 | |
| SCHEMBL15440623 | 0.66 | GRM4 (0.37) | SLC1A2SLC1A1HSD11B1 | |
| SCHEMBL7079218 | 0.66 | GRM2 (0.33) | SLC1A2SLC1A1 | |
| SCHEMBL76019 | 0.66 | GRM4 (0.37) | SLC1A2SLC1A1HSD11B1 | |
| SCHEMBL4452499 | 0.66 | SLC6A12 (0.46) | SLC1A2SLC1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8334088-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-20110045407-A1 | Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| US-7883828-B2 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-08 | — | — | US | disclosed |
| US-7824845-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-02 | — | — | US | disclosed |
| US-20090081598-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081597-A1 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081579-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081585-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |