SCHEMBL1151750

SCHEMBL1151750

C=C(C)C(=O)OCCOC(=O)C1C=CCCC1C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.39
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
TSHR P16473 3/20 0.35
ALDH1A1 P00352 1/20 0.34
MAPT P10636 1/20 0.33
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
PPM1B O75688 1/20 0.31
PTPN1 P18031 1/20 0.31
PPP1CC P36873 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7202203 0.95 POLB (0.42) THRBPOLBAPEX1HTTTDP1
SCHEMBL7202089 0.95 POLB (0.40) THRBPOLBAPEX1HTTTDP1
SCHEMBL7703928 0.92 THRB (0.41) THRBPOLBAPEX1HTTTDP1
SCHEMBL2781080 0.90 THRB (0.39) THRBPOLBAPEX1HTTTDP1
SCHEMBL14990612 0.85
SCHEMBL10963112 0.84 TSHR (0.33) TSHR
SCHEMBL2200972 0.83 TSHR (0.37) TSHRMAPT
SCHEMBL11616214 0.82 MAPT (0.35) MAPT
SCHEMBL11679846 0.82 MAPT (0.35) TDP1ALDH1A1MAPT
SCHEMBL6323292 0.82 PPM1B (0.47) TDP1TSHRALDH1A1MAPTPPM1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240150549-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, TRANSPARENT ANTENNA AND MANUFACTURING METHOD THEREFOR, AND IMAGE DISPLAY DEVICE RESONAC CORPORATION (JP) 2024-05-09 US disclosed
EP-3786247-B1 LATEX FOR ADHESIVE COMPOSITION AND ADHESIVE COMPOSITION RESONAC CORP (JP) 2023-12-27 EP disclosed
EP-4282397-A1 COSMETIC PREPARATION Shiseido Company, Ltd. (JP) 2023-11-29 EP disclosed
WO-2023210746-A1 POLYMER, CURABLE RESIN COMPOSITION, STRETCHABLE INSULATING CURED FILM OBTAINED BY CURING SAID COMPOSITION, INSULATING CURED FILM FOR TOUCH PANEL, TOUCH PANEL, INSULATING CURED FILM FOR FLEXIBLE PRINTED CIRCUIT BOARD, AND FLEXIBLE PRINTED CIRCUIT BOARD 大阪有機化学工業株式会社 2023-11-02 WO disclosed
US-20230197630-A1 METHOD FOR MANUFACTURING ELECTRONIC COMPONENT, RESIN COMPOSITION FOR TEMPORARY PROTECTION, AND RESIN FILM FOR TEMPORARY PROTECTION RESONAC CORPORATION (JP) 2023-06-22 US disclosed
WO-2022177009-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, TRANSPARENT ANTENNA AND MANUFACTURING METHOD THEREFOR, AND IMAGE DISPLAY DEVICE 昭和電工マテリアルズ株式会社 2022-08-25 WO disclosed
EP-3260477-B1 COMPOSITION FOR POLYMERIZATION, METHOD FOR PRODUCING SAME, COATING COMPOSITION CONTAINING SAME, METHOD FOR PRODUCING COATING COMPOSITION CONTAINING SAID COMPOSITIONS, AND METHOD FOR PRODUCING COATING FUJIFILM CORP (JP) 2022-08-24 EP disclosed
CN-114755886-A Photosensitive resin composition, dry film, cured product and printed wiring board 互应化学工业株式会社 2022-07-15 CN disclosed
US-11330721-B2 Resin film, and laminated film including base material film, resin film formed on base material film, and protective film attached to resin film SHOWA DENKO MATERIALS CO., LTD (JP) 2022-05-10 US disclosed
CN-108475015-B Photosensitive resin composition, dry film and printed wiring board 互应化学工业株式会社 2022-03-18 CN disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
US-20020146629-A1 Ultraviolet-curable resin composition TAIYO INK MANUFACTURING CO., LTD. (JP) 2002-10-10 US disclosed
EP-1219680-A1 ULTRAVIOLET-CURABLE RESIN COMPOSITION Taiyo Ink Manufacturing Co. Ltd (JP) 2002-07-03 EP disclosed
US-6344299-B1 3,3',4,4'-BENZOPHENONETETRACARBOXYLIC DIANHYDRIDE DERIVATIVES CHISSO CORPORATION (JP) 2002-02-05 US disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-6143803-A PROTECTION WITH CURABLE FILM AND ETCHING TOAGOSEI CO., LTD. (JP) 2000-11-07 US disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed
US-5336574-A Secondary etch resist material containing a compound with a (meth)acryloyl and a carboxy group and another with two or more (meth)acryloyl groups, along with a leveling agent and a chain transfer agent and/or a photoinitiator TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1994-08-09 US disclosed
US-4551215-A EPOXY COMPOUND, PHOTOPOLYMERIZABLE COMPOUND HAVING CARBOXYL, AND PHOTOSENSITIZER TOYO BOSEKI KABUSHIKI KAISHA (JP) 1985-11-05 US disclosed