⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11526838 | 0.98 | HCAR2 (0.32) | — | |
| SCHEMBL11529909 | 0.79 | — | — | |
| SCHEMBL11526731 | 0.77 | PDPK1 (0.33) | — | |
| SCHEMBL11532442 | 0.74 | YTHDC1 (0.39) | — | |
| SCHEMBL12050672 | 0.73 | — | — | |
| SCHEMBL11530994 | 0.73 | YTHDC1 (0.38) | — | |
| SCHEMBL4811382 | 0.71 | — | — | |
| SCHEMBL1930145 | 0.71 | — | — | |
| Water SCHEMBL6474736 | 0.71 | LDHA (0.37) | — | |
| SCHEMBL29757485 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3241075-B1 | STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2024-10-16 | — | — | EP | disclosed |
| CN-107850859-B | Stripping composition for removing photoresist on semiconductor substrate | 富士胶片电子材料美国有限公司 | 2021-06-01 | — | — | CN | disclosed |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20190121233-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-25 | — | — | US | disclosed |
| US-9914902-B2 | Stripping compositions for removing photoresists from semiconductor substrates | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2018-03-13 | — | — | US | disclosed |
| EP-3241075-A1 | STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES | FujiFilm Electronic Materials USA, Inc. (US) | 2017-11-08 | — | — | EP | disclosed |
| US-20160186106-A1 | STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR SUBSTRATES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2016-06-30 | — | — | US | disclosed |
| US-4142046-A | BACTERICIDES, 7-AMINO-CEPHALOSPORINS | SMITHKLINE CORPORATION (US) | 1979-02-27 | — | — | US | disclosed |
| US-4060610-A | Pharmaceutical compositions comprising 7-acyl-3-(substituted triazolyl thiomethyl)-cephalosporins and methods of treating bacterial infections | SMITHKLINE CORPORATION (US) | 1977-11-29 | — | — | US | disclosed |
| US-3989694-A | ANTIBACTERIAL | SMITHKLINE CORPORATION (US) | 1976-11-02 | — | — | US | disclosed |