Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.64 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.64 |
| ▸ | HPGD | P15428 | 3/20 | 0.64 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 2/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | BLM | P54132 | 1/20 | 0.43 |
| ▸ | CES2 | O00748 | 3/20 | 0.42 |
| ▸ | CES1 | P23141 | 3/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.42 |
| ▸ | CA6 | P23280 | 1/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL1157122 | 0.97 | ALDH1A1 (0.61) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL10706022 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL642599 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL3942385 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL128144 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL4351997 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL7199331 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL5667381 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL2291422 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 | |
| Phthalic Acid SCHEMBL16341729 | 0.94 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDCA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114479673-B | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-03-12 | — | — | CN | claimed |
| CN-115352137-A | Fireproof assembly for steel structure and preparation process and application thereof | 华创建筑设计有限公司 | 2022-11-18 | — | — | CN | claimed |
| CN-114479673-A | Polishing slurry composition | 凯斯科技股份有限公司 | 2022-05-13 | — | — | CN | claimed |
| US-20220127495-A1 | POLISHING SLURRY COMPOSITION | KCTECH CO., LTD. (KR) | 2022-04-28 | — | — | US | claimed |
| WO-2020138737-A1 | ONE-COMPONENT POLISHING SLURRY COMPOSITION AND POLISHING METHOD USING SAME | 주식회사 케이씨텍 | 2020-07-02 | — | — | WO | claimed |
| US-4642393-A | Process for preparing 1,4-dihydroxy, 5,8-dihydronaphthalene and related compounds | KOPPERS COMPANY, INC. (US) | 1987-02-10 | — | — | US | claimed |
| US-12617973-B2 | Slurry compositions for polishing metal layers, chemical mechanical polishing apparatuses using the same, and methods for fabricating semiconductor devices using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-05 | — | — | US | disclosed |
| US-12476114-B2 | Chemical mechanical polishing method and method for fabricating semiconductor device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-11-18 | — | — | US | disclosed |
| US-20250002755-A1 | SLURRY COMPOSITION FOR METAL POLISHING | KCTECH CO., LTD. (KR) | 2025-01-02 | — | — | US | disclosed |
| CN-114127211-B | Method for improving barrier film removal rate in bulk tungsten slurry | CMC材料有限责任公司 | 2024-06-25 | — | — | CN | disclosed |
| WO-2024096277-A1 | POLISHING SLURRY COMPOSITION | 주식회사 케이씨텍 | 2024-05-10 | — | — | WO | disclosed |
| CN-117980424-A | Slurry composition for metal polishing | 凯斯科技股份有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-114479673-B | Polishing slurry composition | 凯斯科技股份有限公司 | 2024-03-12 | — | — | CN | disclosed |
| US-5164351-A | Transition metal complexes | Steinbach, Friedrich (DE) | 1992-11-17 | — | — | US | disclosed |
| US-4642393-A | Process for preparing 1,4-dihydroxy, 5,8-dihydronaphthalene and related compounds | KOPPERS COMPANY, INC. (US) | 1987-02-10 | — | — | US | disclosed |
| US-4604296-A | WASHING FERROMAGNETIC METAL FINE POWDER WITH SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 1986-08-05 | — | — | US | disclosed |
| EP-0108624-B1 | PROCESS FOR THE PRODUCTION OF P-VINYL PHENOL POLYMER | MARUZEN OIL CO., LTD. (JP) | 1986-02-19 | — | — | EP | disclosed |
| US-4517349-A | MOLECULAR ERIGHT CONTROL | MARUZEN OIL COMPANY, LIMITED (JP) | 1985-05-14 | — | — | US | disclosed |
| EP-0108624-A1 | Process for the production of p-vinyl phenol polymer | MARUZEN OIL CO., LTD. (JP) | 1984-05-16 | — | — | EP | disclosed |
| US-4207218-A | ANTICAKING AGENTS, STORAGE STABILITY | THE B. F. GOODRICH COMPANY (US) | 1980-06-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12617973-B2 | Slurry compositions for polishing metal layers, chemical mechanical polishing apparatuses using the same, and methods for fabricating semiconductor devices using the same | SOD1, SCO2, ITK | ALDH1A1 2788/4885KDM4E 267/4885HPGD 4400/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.