Pyrophosphoric Acid

Pyrophosphoric Acid

SCHEMBL11596222

O=P(O)(O)OP(=O)(O)O.[Tl]

nearest known ligand 0.91

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Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ FDPS P14324 1/20 0.91
▸ BLM P54132 1/20 0.91
▸ TDP1 Q9NUW8 1/20 0.91
▸ CA4 P22748 1/20 0.37
▸ CA2 P00918 1/20 0.36
▸ INPPL1 O15357 2/20 0.35
▸ INPP5A Q14642 2/20 0.35
▸ SMPD1 P17405 1/20 0.35
▸ INPP5B P32019 1/20 0.35
▸ BTN3A1 O00481 2/20 0.35
▸ ITPR3 Q14573 3/20 0.33
▸ SLC34A1 Q06495 1/20 0.33
▸ ITPR2 Q14571 1/20 0.33
▸ ITPR1 Q14643 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Pyrophosphoric Acid SCHEMBL8851914 0.95 FDPS (1.00) FDPSBLMTDP1CA4CA2
Pyrophosphoric Acid SCHEMBL29634664 0.95 — —
Pyrophosphoric Acid SCHEMBL292348 0.95 FDPS (1.00) FDPSBLMTDP1CA4CA2
Pyrophosphoric Acid SCHEMBL3654 0.95 — —
Pyrophosphoric Acid SCHEMBL23537580 0.91 FDPS (0.91) FDPSBLMTDP1CA4CA2
Pyrophosphoric Acid SCHEMBL2770398 0.91 FDPS (0.91) FDPSBLMTDP1CA4CA2
Pyrophosphoric Acid SCHEMBL513553 0.91 FDPS (0.91) FDPSBLMTDP1CA4CA2
Pyrophosphoric Acid SCHEMBL21145230 0.91 FDPS (0.91) FDPSBLMTDP1CA4CA2
Pyrophosphoric Acid SCHEMBL21433694 0.91 FDPS (0.91) FDPSBLMTDP1CA4CA2
Pyrophosphoric Acid SCHEMBL209640 0.91 FDPS (0.91) FDPSBLMTDP1CA4CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4052323-A HIGH-TEMPERATURE LUBRICANT FOR THE HOT-WORKING OF METALS LONZA, LTD. (CH) 1977-10-04 — — US claimed
US-4120808-A Gas discharge dielectric containing a source of boron, gallium, indium, or thallium OWENS-ILLINOIS, INC. (US) 1978-10-17 — — US disclosed
US-4084980-A STABILIZERS OF ACTIVATED CARBON, ZEOLITE, SILICA GEL, CARBON BLACK, TALC, AND MICA SHIKOKU KAKEN KOGYO KABUSHIKI KAISHA (JA) 1978-04-18 — — US disclosed
US-4052323-A HIGH-TEMPERATURE LUBRICANT FOR THE HOT-WORKING OF METALS LONZA, LTD. (CH) 1977-10-04 — — US disclosed
US-4028578-A Gas discharge dielectric containing a source of boron, gallium, indium, or thallium OWENS-ILLINOIS, INC. (US) 1977-06-07 — — US disclosed
US-4028424-A FROM AN ALPHA-OLEFIN AND AN ALDEHYDE JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1977-06-07 — — US disclosed
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