SCHEMBL1164310

SCHEMBL1164310

CCCCOC(=O)c1cccc2cc3ccccc3cc12

nearest known ligand 0.67

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.67
TDP1 Q9NUW8 3/20 0.67
L3MBTL1 Q9Y468 2/20 0.67
MAPK1 P28482 3/20 0.60
CYP3A4 P08684 2/20 0.60
TP53 P04637 1/20 0.60
ALDH1A1 P00352 8/20 0.59
LMNA P02545 2/20 0.59
HSD17B10 Q99714 2/20 0.58
KDM4E B2RXH2 4/20 0.52
POLB P06746 1/20 0.52
HRH3 Q9Y5N1 1/20 0.50
GAA P10253 1/20 0.50
CNR1 P21554 1/20 0.47
CNR2 P34972 1/20 0.47
ATM Q13315 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2492898 0.96 TSHR (0.68) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL18525768 0.94 TSHR (0.66) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL29113041 0.91 ALDH1A1 (0.65) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL29649093 0.87 TSHR (0.73) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL6904320 0.87 TSHR (0.73) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL7022191 0.85 TSHR (0.62) TSHRALDH1A1LMNAHSD17B10KDM4E
SCHEMBL163609 0.85 TSHR (0.57) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL16859573 0.85 TSHR (0.74) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL27970683 0.84 TSHR (0.66) TSHRTDP1L3MBTL1MAPK1CYP3A4
SCHEMBL29043958 0.84 ALDH1A1 (0.54) TSHRTDP1L3MBTL1MAPK1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8168109-B2 Stabilizers for vinyl ether resist formulations for imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-01 US claimed
WO-2011020675-A1 STABILIZERS FOR VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-02-24 WO claimed
US-20110042862-A1 Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography INTERNATIONAL BUSINESS CORPORATION (US) 2011-02-24 US claimed
US-8168109-B2 Stabilizers for vinyl ether resist formulations for imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-01 US disclosed
WO-2011020675-A1 STABILIZERS FOR VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-02-24 WO disclosed
US-20110042862-A1 Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography INTERNATIONAL BUSINESS CORPORATION (US) 2011-02-24 US disclosed