SCHEMBL1164565

SCHEMBL1164565

CC(=O)OCC[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.44
CHRM5 P08912 2/20 0.43
CHRM1 P11229 2/20 0.43
CHRM3 P20309 2/20 0.43
PGR P06401 1/20 0.43
CHRM2 P08172 1/20 0.43
CHRM4 P08173 1/20 0.43
HTR1A P08908 1/20 0.43
CHRNB2 P17787 1/20 0.43
TBXA2R P21731 1/20 0.43
CHRNB4 P30926 1/20 0.43
CHRNA3 P32297 1/20 0.43
CHRNA7 P36544 1/20 0.43
CHRNA4 P43681 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
CHRNA10 Q9GZZ6 1/20 0.43
CHRNA9 Q9UGM1 1/20 0.43
TSHR P16473 1/20 0.43
GALR3 O60755 2/20 0.41
GAA P10253 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL826515 0.80 ALDH1A1 (0.48) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL13151102 0.78 ALDH1A1 (0.46) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL523163 0.76 ALDH1A1 (0.44) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL26454698 0.76 ALDH1A1 (0.44) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL13150993 0.76 ALDH1A1 (0.48) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL523505 0.76 ALDH1A1 (0.44) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL1473802 0.74 ALDH1A1 (0.43) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL3335756 0.74 ALDH1A1 (0.43) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL13151001 0.74 ALDH1A1 (0.43) ALDH1A1CHRM5CHRM1CHRM3PGR
SCHEMBL7783389 0.74 TSHR (0.52) ALDH1A1SMN1; SMN2TSHRHSD17B10CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6291696-B2 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-09-18 US claimed
US-20010007909-A1 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-07-12 US claimed
US-8168109-B2 Stabilizers for vinyl ether resist formulations for imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-01 US disclosed
WO-2011020675-A1 STABILIZERS FOR VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-02-24 WO disclosed
US-20110042862-A1 Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithography INTERNATIONAL BUSINESS CORPORATION (US) 2011-02-24 US disclosed
US-6291696-B2 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-09-18 US disclosed
US-6291696-B2 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-09-18 US disclosed
JP-2001253885-A METHOD FOR PRODUCING TRIS(TRIMETHYLSILYL)SILYLETHYL ESTER SHIN ETSU CHEM CO LTD 2001-09-18 JP disclosed
US-20010007909-A1 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-07-12 US disclosed
US-20010007909-A1 Preparation of tris (trimethylsilyl) silylethyl esters SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-07-12 US disclosed