Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.43 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.43 |
| ▸ | PGR | P06401 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.43 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.43 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.43 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.43 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.43 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.43 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | GALR3 | O60755 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL524942 | 0.86 | ALDH1A1 (0.52) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL523163 | 0.86 | ALDH1A1 (0.44) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL523168 | 0.83 | ALDH1A1 (0.46) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL15070973 | 0.83 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL826515 | 0.80 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL6510428 | 0.79 | THRB (0.50) | ALDH1A1TSHRHTT | |
| SCHEMBL13151102 | 0.78 | ALDH1A1 (0.46) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL4951128 | 0.77 | ALDH1A1 (0.52) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL1807368 | 0.77 | ALDH1A1 (0.41) | ALDH1A1CHRM5CHRM1CHRM3PGR | |
| SCHEMBL13150993 | 0.76 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3PGR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024172770-A1 | PRINTABLE WAX, METHOD OF PRINTING, AND METHOD FOR FLOW VISCOSITY CONTROL | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2024-08-22 | — | — | WO | claimed |
| CN-115651442-A | High-strength aerogel steel structure fireproof coating and preparation method thereof | 睿安天地(博野)防火材料制造有限公司 | 2023-01-31 | — | — | CN | claimed |
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| WO-2007040816-A2 | TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040834-A2 | PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-6046293-A | Solid-liquid phase interfacial polymerization | UNIVERSITY OF SOUTH AUSTRALIA (AU) | 2000-04-04 | — | — | US | claimed |
| US-5977248-A | POLYSILOXANES | DOW CORNING CORPORATION (US) | 1999-11-02 | — | — | US | claimed |
| EP-0799851-A2 | Preparation of polyorganosilloxanes by interfacial polymerization | DOW CORNING CORPORATION (US) | 1997-10-08 | — | — | EP | claimed |
| US-5629401-A | Preparation of polyorganosiloxanes by interfacial polymerization | DOW CORNING CORPORATION (US) | 1997-05-13 | — | — | US | claimed |
| CN-119702389-A | Micro-fog spraying preparation method of photonic crystal coating | 中国科学院化学研究所 | 2025-03-28 | — | — | CN | disclosed |
| US-4252977-A | Novel acetamide compounds and process for producing them | GENERAL ELECTRIC COMPANY (US) | 1981-02-24 | — | — | US | disclosed |