Di(Hydroxyethyl)Ether

Di(Hydroxyethyl)Ether

SCHEMBL1170957

CC(CS)C(=O)O.CC(CS)C(=O)O.OCCOCCO

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ENPEP Q07075 2/20 0.44
TSHR P16473 2/20 0.42
MAPK1 P28482 1/20 0.42
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
ALDH1A1 P00352 1/20 0.36
GABRR1 P24046 2/20 0.35
CYP1A2 P05177 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL1171186 0.84 ENPEP (0.52) ENPEPGABRR1CYP1A2
Ethylene Glycol SCHEMBL27658842 0.84 ENPEP (0.52) ENPEPGABRR1CYP1A2
SCHEMBL3742130 0.82
SCHEMBL8433171 0.82
SCHEMBL161586 0.82
SCHEMBL9912814 0.81 GABRR1 (0.46) ENPEPTSHRMAPK1MEN1KMT2A
Di(Hydroxyethyl)Ether SCHEMBL29239546 0.80 TSHR (0.48) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL29124601 0.80 TSHR (0.48) TSHRMAPK1MEN1KMT2AALDH1A1
Di(Hydroxyethyl)Ether SCHEMBL1171068 0.80 TSHR (0.48) TSHRMAPK1MEN1KMT2AALDH1A1
1,4-Butanediol SCHEMBL4458925 0.80 ENPEP (0.48) ENPEPGABRR1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7989567-B2 Method for production of water/oil repellent composition and article ASAHI GLASS COMPANY, LIMITED (JP) 2011-08-02 US claimed
US-12492293-B2 Multi-component systems for preparing foamed products ARKEMA FRANCE (FR) 2025-12-09 US disclosed
US-12378450-B2 Adhesive for endoscope and cured product thereof, and endoscope and method for producing the same FUJIFILM CORPORATION (JP) 2025-08-05 US disclosed
US-20250064687-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER KURARAY NORITAKE DENTAL INC. (JP) 2025-02-27 US disclosed
EP-4458344-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER Kuraray Noritake Dental Inc. (JP) 2024-11-06 EP disclosed
US-20240299258-A1 DENTAL CURABLE COMPOSITION KURARAY NORITAKE DENTAL INC. (JP) 2024-09-12 US disclosed
EP-4364718-A1 DENTAL CURABLE COMPOSITION Kuraray Noritake Dental Inc. (JP) 2024-05-08 EP disclosed
US-20240110071-A1 Ultraviolet-Curable Water-Based Ink, Dispersion, Ultraviolet-Curable Water-Based Composition, and Printed Matter MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-04 US disclosed
EP-4328246-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2024-02-28 EP disclosed
EP-3891210-B1 MULTI-COMPONENT SYSTEMS FOR PREPARING FOAMED PRODUCTS ARKEMA FRANCE (FR) 2023-08-23 EP disclosed
US-7569327-B2 Curable polymer compound SHOWDA DENKO K.K. (JP) 2009-08-04 US disclosed
EP-2055726-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Showa Denko K.K. (JP) 2009-05-06 EP disclosed
US-20090023831-A1 Curable Composition Containing Thiol Compound SHOWA DENKO K.K. (JP) 2009-01-22 US disclosed
EP-1983017-A1 CURABLE COMPOSITION CONTAINING THIOL COMPOUND Showa Denko K.K. (JP) 2008-10-22 EP disclosed
EP-1629046-B1 CURABLE POLYMER COMPOUND SHOWA DENKO KK (JP) 2008-05-14 EP disclosed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US disclosed
US-20070021571-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-01-25 US disclosed
US-20060079593-A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same SHOWA DENKO K.K. (JP) 2006-04-13 US disclosed
US-20060041053-A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition SHOWA DENKO K.K. (JP) 2006-02-23 US disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250064687-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER MGMT, SEM1, CARM1 ENPEP 2241/4885TSHR 3622/4885MAPK1 3230/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.