Di(Hydroxyethyl)Ether

Di(Hydroxyethyl)Ether

SCHEMBL1171016

CC(C)(S)C(=O)O.CC(C)(S)C(=O)O.OCCOCCO

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.48
MAPK1 P28482 1/20 0.48
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
ALDH1A1 P00352 3/20 0.40
MAPT P10636 2/20 0.37
THRB P10828 1/20 0.37
HTT P42858 1/20 0.37
CYP4F2 P78329 1/20 0.34
CYP4A11 Q02928 1/20 0.34
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
HIF1A Q16665 1/20 0.32
PPARA Q07869 2/20 0.32
PTGS1 P23219 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Di(Hydroxyethyl)Ether SCHEMBL2528560 0.91 TSHR (0.48) TSHRMAPK1MEN1KMT2AALDH1A1
Triethylene Glycol SCHEMBL11010343 0.88 MEN1 (0.50) TSHRMAPK1MEN1KMT2AALDH1A1
Pivalate SCHEMBL4885836 0.85 TSHR (0.53) TSHRMAPK1MEN1KMT2AALDH1A1
Pivalate SCHEMBL11109449 0.85 TSHR (0.53) TSHRMAPK1MEN1KMT2AALDH1A1
Triethylene Glycol SCHEMBL1640973 0.83 MEN1 (0.55) TSHRMAPK1MEN1KMT2AALDH1A1
Tetraethylene Glycol SCHEMBL4886960 0.83 MEN1 (0.55) TSHRMAPK1MEN1KMT2AALDH1A1
Ethylene Glycol SCHEMBL1171759 0.82 TSHR (0.42) TSHRALDH1A1MAPTCYP2D6CYP2C19
Ethylene Glycol SCHEMBL1271417 0.82 TSHR (0.42) TSHRALDH1A1MAPTCYP2D6CYP2C19
Di(Hydroxyethyl)Ether SCHEMBL11471879 0.79 TSHR (0.46) TSHRMAPK1MEN1KMT2AALDH1A1
SCHEMBL15012611 0.77 MEN1 (0.48) TSHRMAPK1MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12492293-B2 Multi-component systems for preparing foamed products ARKEMA FRANCE (FR) 2025-12-09 US disclosed
US-12378450-B2 Adhesive for endoscope and cured product thereof, and endoscope and method for producing the same FUJIFILM CORPORATION (JP) 2025-08-05 US disclosed
US-20250064687-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER KURARAY NORITAKE DENTAL INC. (JP) 2025-02-27 US disclosed
EP-4458344-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER Kuraray Noritake Dental Inc. (JP) 2024-11-06 EP disclosed
US-20240299258-A1 DENTAL CURABLE COMPOSITION KURARAY NORITAKE DENTAL INC. (JP) 2024-09-12 US disclosed
WO-2024142769-A1 RESIN COMPOSITION, COMPOSITE MATERIAL, AND CURED PRODUCTS OF THESE 株式会社レゾナック 2024-07-04 WO disclosed
EP-4364718-A1 DENTAL CURABLE COMPOSITION Kuraray Noritake Dental Inc. (JP) 2024-05-08 EP disclosed
US-20240110071-A1 Ultraviolet-Curable Water-Based Ink, Dispersion, Ultraviolet-Curable Water-Based Composition, and Printed Matter MITSUBISHI CHEMICAL CORPORATION (JP) 2024-04-04 US disclosed
EP-4328246-A1 ULTRAVIOLET-CURABLE AQUEOUS INK, DISPERSION, ULTRAVIOLET-CURABLE AQUEOUS COMPOSITION, AND PRINTED MATTER Mitsubishi Chemical Corporation (JP) 2024-02-28 EP disclosed
EP-3891210-B1 MULTI-COMPONENT SYSTEMS FOR PREPARING FOAMED PRODUCTS ARKEMA FRANCE (FR) 2023-08-23 EP disclosed
EP-2055726-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Showa Denko K.K. (JP) 2009-05-06 EP disclosed
US-20090023831-A1 Curable Composition Containing Thiol Compound SHOWA DENKO K.K. (JP) 2009-01-22 US disclosed
EP-1983017-A1 CURABLE COMPOSITION CONTAINING THIOL COMPOUND Showa Denko K.K. (JP) 2008-10-22 EP disclosed
EP-1629046-B1 CURABLE POLYMER COMPOUND SHOWA DENKO KK (JP) 2008-05-14 EP disclosed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US disclosed
US-20070021571-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-01-25 US disclosed
US-20060079593-A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same SHOWA DENKO K.K. (JP) 2006-04-13 US disclosed
US-20060041053-A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition SHOWA DENKO K.K. (JP) 2006-02-23 US disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250064687-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER MGMT, SEM1, CARM1 TSHR 3622/4885MAPK1 3230/4885MEN1 3326/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.