SCHEMBL11802153

SCHEMBL11802153

CC(O)=S.CC(O)=S.CC(O)=S.CCC(CO)(CO)CO

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32
TSHR P16473 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7037751 0.86 ALDH1A1 (0.30) ALDH1A1TSHR
SCHEMBL11124817 0.86 ALDH1A1 (0.30) ALDH1A1TSHR
SCHEMBL28366677 0.84 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL15026 0.84
SCHEMBL175428 0.84 TSHR (0.41) ALDH1A1TSHR
SCHEMBL5907424 0.84 TSHR (0.41) ALDH1A1TSHR
SCHEMBL4379385 0.84
Acetic Acid SCHEMBL3683188 0.82 FFAR3 (0.41) ALDH1A1TSHR
Acetic Acid SCHEMBL5145909 0.82 FFAR3 (0.41) ALDH1A1TSHR
Acetic Acid SCHEMBL29697739 0.82 FFAR3 (0.41) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110520794-B Polymerizable composition, photosensitive composition for black matrix, and photosensitive composition for black column spacer 株式会社艾迪科 2025-04-04 CN disclosed
CN-119677823-A Additive manufacturing using recycled materials PPG工业俄亥俄公司 2025-03-21 CN disclosed
CN-110546134-B Oxime ester compound and photopolymerization initiator containing the same 株式会社艾迪科 2024-12-20 CN disclosed
CN-114867813-B Sealing method 日东电工株式会社 2024-12-13 CN disclosed
CN-114867600-B Sealant sheet with release liner 日东电工株式会社 2024-11-26 CN disclosed
CN-110520796-B Polymerizable composition, photosensitive composition for black matrix, and photosensitive composition for black column spacer 株式会社艾迪科 2024-11-12 CN disclosed
CN-115777003-B Isocyanate modified polyimide resin, resin composition and cured product thereof 日本化药株式会社 2024-11-05 CN disclosed
CN-118843832-A Photosensitive resin composition, cured product, black matrix, and image display device 三菱化学株式会社 2024-10-25 CN disclosed
CN-118284635-A Photocurable resin composition, fuel cell, and sealing method 三键有限公司 2024-07-02 CN disclosed
CN-117916666-A Composition, method for producing cured product, color filter, and compound 株式会社艾迪科 2024-04-19 CN disclosed
CN-111868137-B Epoxy resin composition 积水化学工业株式会社 2023-08-15 CN disclosed
CN-116390997-A Nanocrystalline-containing composition, ink composition, light conversion layer, and light-emitting element DIC株式会社 2023-07-04 CN disclosed
CN-110885401-B Copolymer, curable resin composition containing same, and cured product thereof 株式会社大赛璐 2023-06-13 CN disclosed
CN-116096706-A Compound, polymerization initiator, polymerizable composition, cured product, color filter, and method for producing cured product 株式会社艾迪科 2023-05-09 CN disclosed
CN-116017898-A Electronic device and method for assembling electronic device 荣耀终端有限公司 2023-04-25 CN disclosed
CN-115777003-A Isocyanate-modified polyimide resin, resin composition, and cured product thereof 日本化药株式会社 2023-03-10 CN disclosed
CN-109564384-B Photosensitive coloring composition and color filter 东洋油墨SC控股株式会社 2022-09-20 CN disclosed
CN-108474885-B Near-infrared absorbing composition for solid-state imaging element, filter, and solid-state imaging element 东洋油墨SC控股株式会社 2021-04-13 CN disclosed
CN-108290391-A Multi-ply construction including barrier layer and sealant 3M创新有限公司 2018-07-17 CN disclosed
US-3968082-A Stabilized ethylene-carbon monoxide copolymers ATLANTIC RICHFIELD COMPANY (US) 1976-07-06 US disclosed