⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9613271 | 0.73 | LMNA (0.52) | — | |
| SCHEMBL2495212 | 0.72 | — | — | |
| SCHEMBL10021905 | 0.72 | CCR1 (0.45) | — | |
| SCHEMBL31255 | 0.72 | — | — | |
| SCHEMBL4859450 | 0.72 | MAP4K4 (0.56) | — | |
| SCHEMBL13500329 | 0.69 | HSP90AA1 (0.38) | — | |
| Trimethylammonium SCHEMBL28757156 | 0.69 | HSP90AA1 (0.38) | — | |
| SCHEMBL16868 | 0.67 | — | — | |
| SCHEMBL84396 | 0.67 | HSP90AA1 (0.36) | — | |
| SCHEMBL991164 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 863 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12613468-B2 | Method for forming patterned photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-04-28 | — | — | US | claimed |
| CN-112447501-B | Method for forming patterned photoresist layer | 台湾积体电路制造股份有限公司 | 2024-07-26 | — | — | CN | claimed |
| US-20240103375-A1 | METHOD FOR FORMING PATTERNED PHOTORESIST | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-03-28 | — | — | US | claimed |
| US-11886121-B2 | Method for forming patterned photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-01-30 | — | — | US | claimed |
| US-11001564-B2 | Substituted chromane-8-carboxamide compounds and analogues thereof, and methods using same | ARBUTUS BIOPHARMA CORPORATION (CA) | 2021-05-11 | — | — | US | claimed |
| US-20210063888-A1 | METHOD FOR FORMING PATTERNED PHOTORESIST | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-03-04 | — | — | US | claimed |
| US-20200035418-A1 | PASSIVATION OF DEFECTS IN PEROVSKITE MATERIALS FOR IMPROVED SOLAR CELL EFFICIENCY AND STABILITY | NUTECH VENTURES | 2020-01-30 | — | — | US | claimed |
| US-20190225593-A1 | SUBSTITUTED CHROMANE-8-CARBOXAMIDE COMPOUNDS AND ANALOGUES THEREOF, AND METHODS USING SAME | ARBUTUS BIOPHARMA CORP (CA) | 2019-07-25 | — | — | US | claimed |
| WO-2018152494-A1 | PASSIVATION OF DEFECTS IN PEROVSKITE MATERIALS FOR IMPROVED SOLAR CELL EFFICIENCY AND STABILITY | NUTECH VENTURES (US) | 2018-08-23 | — | — | WO | claimed |
| WO-2018052967-A1 | SUBSTITUTED CHROMANE-8-CARBOXAMIDE COMPOUNDS AND ANALOGUES THEREOF, AND METHODS USING SAME | ARBUTUS BIOPHARMA, INC. (US) | 2018-03-22 | — | — | WO | claimed |
| US-20050107381-A1 | 6-membered heteroaryl compounds for the treatment of neurodegenerative disorders | PFIZER, INC. | 2005-05-19 | — | — | US | claimed |
| EP-4076459-B1 | PRMT5 INHIBITORS | MERCK SHARP & DOHME LLC (US) | 2026-04-29 | — | — | EP | disclosed |
| US-12613468-B2 | Method for forming patterned photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-04-28 | — | — | US | disclosed |
| EP-4719392-A2 | COMPOUNDS, COMPOSITIONS, AND METHODS | Tenvie Therapeutics Inc. (US) | 2026-04-08 | — | — | EP | disclosed |
| US-12595248-B2 | PRMT5 inhibitors | MERCK SHARP & DOHME LLC (US) | 2026-04-07 | — | — | US | disclosed |
| US-5003069-A | Chichibabin reaction | REILLY INDUSTRIES, INC. (US) | 1991-03-26 | — | — | US | disclosed |
| EP-0098684-A2 | Modified chichibabin reaction, and novel pyridine derivatives | REILLY INDUSTRIES, INC. (US) | 1984-01-18 | — | — | EP | disclosed |
| US-4416885-A | MUSCULAR DISORDERS | SOCIETE D'ETUDES DE PRODUITS CHIMIQUES (FR) | 1983-11-22 | — | — | US | disclosed |
| US-3996228-A | Pyrimidinoaminoethyl ergoline derivatives | SOCIETA' FARMACEUTICI ITALIA S.P.A. (IT) | 1976-12-07 | — | — | US | disclosed |
| US-3957785-A | ADRENOLYTICS, NONTOXIC, HYPOTENSIVE AGENTS, ANALGESICS | SOCIETA' FARMACEUTICI ITALIA S.P.A. (IT) | 1976-05-18 | — | — | US | disclosed |